• Chip
  • Vol. 3, Issue 3, 100101 (2024)
Ming-Hao Shao1、†, Rui-Ting Zhao1、†, Houfang Liu†、*, Wen-Jia Xu, Yi-Da Guo, Da-Peng Huang, Yu-Zhe Yang, Xin-Ru Li, Wancheng Shao, Peng-Hui Shen, Junwei Liu, Kuanmao Wang, Jinguo Zheng, Zhao-Yi Yan, Jian-Lan Yan, Tian Lu, Yi Yang, and Tian-Ling Ren**
Author Affiliations
  • School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
  • show less
    DOI: 10.1016/j.chip.2024.100101 Cite this Article
    Ming-Hao Shao, Rui-Ting Zhao, Houfang Liu, Wen-Jia Xu, Yi-Da Guo, Da-Peng Huang, Yu-Zhe Yang, Xin-Ru Li, Wancheng Shao, Peng-Hui Shen, Junwei Liu, Kuanmao Wang, Jinguo Zheng, Zhao-Yi Yan, Jian-Lan Yan, Tian Lu, Yi Yang, Tian-Ling Ren. Challenges and recent advances in HfO2-based ferroelectric films for non-volatile memory applications[J]. Chip, 2024, 3(3): 100101 Copy Citation Text show less
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