• Journal of Advanced Dielectrics
  • Vol. 14, Issue 3, 2440005 (2024)
Bochen Lu1, Yuxuan Yang1, Yang Zhang1、3、*, Rong Qin2, Xinlu Xue2、**, Jinyue Peng1, and Haijun Wu1、***
Author Affiliations
  • 1State Key Laboratory for Mechanical Behavior of Materials, Electronic Materials Research Laboratory (Key Lab of Education Ministry) and School of Electronic and Information Engineering, Xi’an Jiaotong University, 710049, Xi’an, P. R. China
  • 2Qinghai Xince Technology Co., Ltd., Huanghe Hydropower Development Co., Ltd., 810007, Xining, P. R. China
  • 3Instrumental Analysis Center, Xi’an Jiaotong University, Xi’an, P. R. China
  • show less
    DOI: 10.1142/S2010135X24400058 Cite this Article
    Bochen Lu, Yuxuan Yang, Yang Zhang, Rong Qin, Xinlu Xue, Jinyue Peng, Haijun Wu. Microstructure of electronic-grade polycrystalline silicon core-matrix interface[J]. Journal of Advanced Dielectrics, 2024, 14(3): 2440005 Copy Citation Text show less

    Abstract

    This paper focuses on the problems encountered in the production process of electronic-grade polycrystalline silicon. It points out that the characterization of electronic-grade polycrystalline silicon is mainly concentrated at the macroscopic scale, with relatively less research at the mesoscopic and microscopic scales. Therefore, we utilize the method of physical polishing to obtain polysilicon characterization samples and then the paper utilizes metallographic microscopy, scanning electron microscopy-electron backscatter diffraction technology, and aberration-corrected transmission electron microscopy technology to observe and characterize the interface region between silicon core and matrix in the deposition process of electronic-grade polycrystalline silicon, providing a full-scale characterization of the interface morphology, grain structure, and orientation distribution from macro to micro. Finally, the paper illustrates the current uncertainties regarding polycrystalline silicon.
    Bochen Lu, Yuxuan Yang, Yang Zhang, Rong Qin, Xinlu Xue, Jinyue Peng, Haijun Wu. Microstructure of electronic-grade polycrystalline silicon core-matrix interface[J]. Journal of Advanced Dielectrics, 2024, 14(3): 2440005
    Download Citation