A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask

Wenjing ZHANG; Kaixin ZHANG; Tianxi YANG; Jie SUN; Qun YAN; Chang LIN; Bingxin JIANG; Yang LI; Jinhua LAN; Hui CHEN

doi:10.12450/j.gdzjs.202402006

Journals >Optoelectronic Technology >Volume 44 >Issue 2 >Page 116 > Article

Optoelectronic Technology
Vol. 44, Issue 2, 116 (2024)

A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask

Wenjing ZHANG¹, Kaixin ZHANG¹, Tianxi YANG², Jie SUN^1、3, Qun YAN², Chang LIN², Bingxin JIANG¹, Yang LI¹, Jinhua LAN¹, and Hui CHEN¹

Author Affiliations

¹National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, and Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 35000, CHN

²Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350100, CHN

³Quantum Device Physics Laboratory, Chalmers University of Technology, Göteborg41296, Sweden

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DOI: 10.12450/j.gdzjs.202402006 Cite this Article

Wenjing ZHANG, Kaixin ZHANG, Tianxi YANG, Jie SUN, Qun YAN, Chang LIN, Bingxin JIANG, Yang LI, Jinhua LAN, Hui CHEN. A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask[J]. Optoelectronic Technology, 2024, 44(2): 116 Copy Citation Text

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Abstract

A calibration scheme was proposed that made appropriate adjustments based on the general steps of lithography exposure and achieved accurate lithography exposure using incompletely matched masks. This study provided a new approach to improving chip preparation efficiency and ensuring alignment accuracy.

Keywords

calibration cross⁃engraving exposure integrated circuit lithography process

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