• Piezoelectrics & Acoustooptics
  • Vol. 46, Issue 6, 995 (2024)
ZOU Youyun, BU Yifan, DU Wenjie, DENG Jie, and MA Jianqiang
Author Affiliations
  • Faculty of Mechanical Engineering and Mechanics, Ningbo University, Ningbo 315211, China
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    DOI: 10.11977/j.issn.1004-2474.2024.06.026 Cite this Article
    ZOU Youyun, BU Yifan, DU Wenjie, DENG Jie, MA Jianqiang. Design of a Transmissive Deformable Lens for Compensating Optical Aberrations of Lithography Object Lens[J]. Piezoelectrics & Acoustooptics, 2024, 46(6): 995 Copy Citation Text show less
    References

    [1] LEVINSON H J. Extreme ultraviolet lithography[M]. Bellingham, Washington: SPIE,2020.

    [2] LEVINSON H J. High-NA EUV lithography: current status and outlook for the future[J]. Japanese Journal of Applied Physics,2022,61: SD0803.

    [3] RAO Changhui, ZHONG Libo, GUO Youming, et al. Astronomical adaptive optics: A review[J]. PhotoniX,2024,5:1-52.

    [6] NAKASHIMA T, OHMURA Y, OGATA T, et al. Thermal aberration control in projection lens[C]∥San Jose, California, USA: SPIE Advanced Lithography, Proceedings of SPIE,2008,6924(2):69241V.1-69241V.9.

    [7] GUO K, NI M Y, CHEN H N, et al. A monolithic adjusting mechanism for optical elementbased on modified 6-PSS parallel mechanism[J]. Sensors and Actuators A Physical,2016,251:1-9.

    [8] OHMURA Y, TSUGE Y, HIRAYAMA T, et al. High-order aberration control during exposure for leading-edge lithography projection optics[C]∥San Jose, California, USA: SPIE Advanced Lithography, Proceedings of SPIE, 2016,9780:97800Y.1-97800Y.8.

    [9] SAATHOF R, SCHUTTEN G J M, SPRONCK J W, et al. Actuation profiles to form Zernike shapes with a thermal active mirror[J]. Optics Letters,2015,40(2):205-208.

    [10] Carl Zeiss SMT GmbH. Projection objective of a microlithographic projection exposure apparatus[P]. United States: US7982969B2,2010.

    [11] PENG Tairan, CUI Yuguo, MA Jianqiang, et al. A low-cost deformable lens for correction of low-order aberrations[J]. Optics Communications,2020,460:125209.

    ZOU Youyun, BU Yifan, DU Wenjie, DENG Jie, MA Jianqiang. Design of a Transmissive Deformable Lens for Compensating Optical Aberrations of Lithography Object Lens[J]. Piezoelectrics & Acoustooptics, 2024, 46(6): 995
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