Contents
2024
Volume: 51 Issue 7
19 Article(s)

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Introduction for Special Issue
[in Chinese]
Ruxin Li, Xiaoshi Zhang, Zhinan Zeng, and Minglie Hu
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0700101 (2024)
Laser Devices and Laser Physics
High Harmonic Extreme Ultraviolet Light Source with High Repetition Rate and Power
Zijuan Wei, Xize Gao, Xiangyu Meng, Zhengyan Li, Qingbin Zhang, Pengfei Lan, and Peixiang Lu
SignificanceAs a desktop-level extreme ultraviolet (EUV) coherent light source, high harmonic generation (HHG) becomes an indispensable tool in fundamental science fields such as atomic and molecular physics, biomedicine, materials chemistry, and precision spectroscopy. The maximum photon energy of high harmonics in ga
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701001 (2024)
Research Progress in Generation and Spectral Technology of High‑Repetition‑Rate Extreme‑Ultraviolet‑Light Sources
Ji Wang, and Kun Zhao
SignificanceThe extreme-ultraviolet high-harmonic light source has attracted significant attention in electron dynamics because of its strong coherence, short pulse duration, and high photon energy. It has been applied in various spectroscopy and imaging studies. Using a high repetition rate, high photon flux, narrow l
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701002 (2024)
Research Progress of Isolated Attosecond Pulse Characterization
Jiacan Wang, Fan Xiao, Xiaowei Wang, Li Wang, Wenkai Tao, Lingyi Zhao, Xi ao Li, and Zengxiu Zhao
SignificanceIn 2023, Pierre Agostini, Ference Krausz and Anne L'Huillier had been awarded the Nobel Prize in Physics for their contribution in experimental methods of generating attosecond pulses of light for the study of electron dynamics in matter. Based on their pioneering work of high harmonics generation (HHG)
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701003 (2024)
Advances in High-Order Harmonic Generation from Laser-Produced Low-Density Plasmas
Jian Gao, and Jian Wu
SignificanceHigh-order harmonics generated by ultrashort intense laser pulses interacting with matter represent a significant advance in the production of coherent extreme ultraviolet (EUV) or soft X-ray sources, and they also lead to the generation of attosecond pulse trains in the time domain. A single isolated attos
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701004 (2024)
Controlling Edge Placement Error in Extreme Ultraviolet Lithography
Jing Cao, Wenhe Yang, Zexu Liu, Yunyi Chen, Xin Wei, and Nan Lin
SignificanceExtreme ultraviolet (EUV) lithography is considered to be the most promising technology for fabricating technology nodes of 7 nm and below in high volume manufacturing (HVM). Due to the shrinkage of semiconductor device features and the increase in process complexity, achieving an acceptable yield is challe
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701005 (2024)
High‑Power Free‑Electron Laser Sources Based on Energy Recovery Linacs for Extreme Ultraviolet Lithography
Kui Zhou, Peng Li, Dai Wu, and Ming Li
SignificanceExtreme ultraviolet (EUV) lithography technology is critical for realizing high-end chip manufacturing at the 7 nm node and below. Currently, EUV lithography machines mainly use laser plasma (LPP) light sources. The maximum EUV power achieved by an LPP light source is approximately 500 W. For nodes smaller
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701007 (2024)
Advanced Applications for Capillary Discharge 46.9 nm Extreme Ultraviolet Laser
Huaiyu Cui, Yujie Shen, Dongdi Zhao, Bo An, and Yongpeng Zhao
SignificanceLaser development represents a significant leap forward in the history of human science. The aggregation of billions (or potentially more) of photons in the same mode makes the laser the “brightest light”, “fastest knife” and “most accurate ruler”. Rapid laser source development and related technologies hav
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701009 (2024)
Research Progress of Beyond Extreme Ultraviolet Multilayers at 6.X nm
Xiaoran Li, Hetao Tang, Jiaoling Zhao, and Fenghua Li
SignificanceThe production of integrated circuits relies primarily on lithography. Extreme Ultraviolet (EUV) lithography employing a light source at 13.5 nm is currently the most advanced lithography technology for high-volume mass production, which has led to unprecedented progress in the development of integrated cir
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701010 (2024)
High Power and High Stability 13.5 nm Extreme Ultraviolet Light Source Driven by High‑Order Harmonics
Kui Li, Runyu Meng, Ruixuan Li, Guangyin Zhang, Mingjie Yao, Hao Xu, Yutong Wang, Jie Li, Xiaoshi Zhang, and Zhongwei Fan
ObjectiveShort wavelength, short-pulse, and high-coherence laser sources are urgently needed for research on ultra-wide dynamics at the microscopic scale. Additionally, with the demand for an ever- increasing chip computing speed, the semiconductor field urgently requires small and low-cost extreme ultraviolet light so
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701011 (2024)
Laser‑Induced Discharge Plasma Extreme Ultraviolet Source
Junwu Wang, Hongwen Xuan, Xinbing Wang, and Vassily S. Zakharov
ObjectiveWith the continuous decrease in feature size in the semiconductor industry, extreme ultraviolet lithography (EUVL) is becoming increasingly crucial in ultrahigh integrated circuit manufacturing. The emission characteristics of tin (Sn) in terms of its high conversion efficiency (CE) and spectral purity (SP) ma
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701012 (2024)
High‑Repetition‑Rate Continuously Tunable Ultra‑Short Pulse Laser Across Range from 192 nm to 300 nm
Huagang Liu, Kaiming Ruan, Jinhui Li, Fei Shi, Jianhong Huang, and Wenxiong Lin
ObjectiveUltraviolet and deep ultraviolet ultrafast lasers have important applications in the development of ultraviolet semiconductor devices, ultrafast spectroscopy, and extreme ultraviolet laser generation owing to their advantages, such as ultrahigh temporal and spatial resolution. Continuous wavelength tuning in t
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701013 (2024)
Optimization of Fast Axial Flow CO2 Laser Amplifier Parameters Based on Genetic Algorithm
Cong You, Wei Huang, Gaojie Lin, Bo Li, Jiang Zhao, and Youyou Hu
ObjectiveThe mainstream approach for obtaining a 13.5 nm extreme ultraviolet (EUV) lithography light source involves laser-excited plasma. This requires the use of a high-power, high-frequency, and high-beam-quality short-pulse CO2 laser, as well as a droplet Sn target, to generate extreme ultraviolet light. To satisfy
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701016 (2024)
Design and Fabrication of High‑Efficiency and High‑Power 976 nm Semiconductor Laser Chips
Peng Fu, Yanchun Zhang, Tao Zhao, Yongming Zhao, Song Tang, Ying Li, and Shendan Han
ObjectiveHigh-power semiconductor laser diodes emitting at approximately 976 nm are in high demand in Yb-doped fiber lasers (YDFL) because YDFLs exhibit strong absorption peaks at approximately 976 nm. Specifically, the absorption cross section is as strong as three times that at a wavelength of approximately 915 nm. T
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701017 (2024)
Experimental Characteristics of High‐Repetition‐Frequency Harmonic Self‐Mode‐Locked Nd∶YVO4 Laser
Shaokun Wang, Miao Hu, Mengmeng Xu, Yingying Ji, Zerong Li, Haozhen Li, Meihua Bi, and Xuefang Zhou
ObjectiveHigh-repetition-rate laser pulse sources have extensive applications in fields such as high-speed optical communications, optical clocks, wireless communications, high-capacity optical networks, quantum communications, and laser ranging. Researchers have proposed various methods to achieve high-repetition-rate
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701018 (2024)
kHz, mJ Level Tunable MgO∶PPLN Mid‐Infrared Optical Parametric Oscillator
Shuai Liu, Kai Chen, Yue Sun, Chao Yan, Hongzhan Qiao, Jiying Chang, Jining Li, Yuye Wang, Kai Zhong, Degang Xu, and Jianquan Yao
ObjectiveNanosecond mid-infrared lasers with central wavelengths of 3?5 μm are used in various applications, such as environmental monitoring, LIDAR , and electro-optical countermeasures, owing to the high atmospheric transmission at this band. Thus, developing high-energy mid-infrared laser sources with high pulse rep
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701019 (2024)
High‑Conversion‑Efficiency High‑Power Deep‑Ultraviolet 266 nm Laser Based on Domestic Commercially Available CLBO Crystal
Hanghang Yu, Zhitao Zhang, and Hongwen Xuan
ObjectiveDeep-ultraviolet (DUV) lasers have important applications in fields such as laser processing and semiconductor photolithography because of their high photon energy. A DUV laser source must have both a high output power and good beam quality for laser machining. Sum-frequency generation (SFG) in nonlinear optic
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701020 (2024)
Interference Suppression and Frequency-Locking Circuit Design in Ultra-Stable Laser Systems
Rui Xiao, Beifei Yan, Zhendi Cai, Pengcheng Fang, Yanqi Xu, Yan Wang, Huanyao Sun, and Qunfeng Chen
ObjectiveUltra-stable lasers, characterized by high-frequency stability and extremely narrow linewidths, serve as vital tools in precision measurement and physics research. They find extensive applications in fields such as atomic clocks, gravitational wave detection, and quantum communication. With improvements in exp
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0701021 (2024)
Rapid Communications
[in Chinese]
Zhimeng Huang, Dongxian Geng, Bida Liu, Dandan Zhou, Fan Zhang, Rui Zhang, Zhitao Peng, Qihua Zhu, and Dongxia Hu
Chinese Journal of Lasers
  • Publication Date: Apr. 10, 2024
  • Vol. 51, Issue 7, 0716003 (2024)