
- Chinese Optics Letters
- Vol. 21, Issue 3, 033602 (2023)
Abstract
Keywords
1. Introduction
Color filter is a crucial component of display/imaging devices, color printing, decoration, consumer products, etc., which dominantly determines the color quality, embracing color vibrancy, saturation, gamut, brightness, and resolution[1,2]. The conventional commercial color filter relies on the absorption characteristic of pigment/dye for a specific wavelength to generate a certain chemical color. The essence of chemical color totally depends on the intrinsic property of pigment/dye, so it is required to use different kinds of pigments/dyes to generate different colors. Additionally, the chemical color holds the disadvantages of being environmentally unfriendly and prone to fading, owing to the fact that the pigments/dyes are toxic and are quite sensitive to UV light and high temperatures. Given this, a nature-inspired method of physical color generation, namely, structural color that originates from physical phenomena such as scattering, interference, or diffraction excited by the interaction between light and nanostructures, has gained abundant attention[3,4]. This new color generation concept enables the generation of vivid colors by simply tuning the geometric parameters or arrangement of nanostructures, leading to a more flexible color toning method.
Until now, various configurations have been extensively researched to construct the color filters, such as nanoholes, nanodisks, nanopillars, and nanogratings[5–8]. However, the fabrication of these patterned nanostructures relies on a complicated and expensive lithography process, which prevents mass production and practical application. Moreover, the colors originating from the patterned nanostructure are greatly affected by the change in incident angle, which is not adequate for those devices requiring a wide field of view. To conquer the above-mentioned issues faced by the patterned nanostructures, a planar thin-film structure is preferred, as it can be easily manufactured via simple processes and industrially achieved on a large scale. Meanwhile, the planar thin-film structures can afford more relaxed angle tolerance[9,10]. A typical thin-film configuration to realize large-scale and angle-insensitive color filters is the metal-dielectric-metal (MDM) Fabry-Perot (FP) resonator that consists of a dielectric layer sandwiched between two metallic layers[11–13]. To further realize ultrathin devices, a simple thin-film structure composed of a dielectric layer made of high-refractive-index lossy materials such as CuO, SiC, a-Si, and a metallic substrate has been recently reported to generate reflective colors[14–17]. It is worth pointing out that the thickness of the lossy dielectric layer is generally tens of nanometers, which is much thinner than the dielectric layer with hundreds of nanometers in the conventional MDM structure. In addition, the high refractive index and thin thickness of the introduced lossy dielectric layer endow this simple structure capable of highly improved angular tolerance while simplifying the manufacturing process and enabling an ultracompact device. Different from the typical F-P resonance supported by the MDM structure, the color generation mechanism of this structure originates from the strong resonance excited by the large optical absorption coefficient of the lossy dielectric layer and the concomitant nontrivial phase transition generated by the reflection at the boundary between the lossy dielectric layer and the metallic layer[18,19]. However, the realized ultrathin thickness and excellent angle-insensitive property of the currently reported lossy dielectric-metal structures work on the premise of sacrificing color saturation in conjunction with gamut, which inevitably hinders their practical application.
Here, a thorough theoretical analysis of the color generation mechanism for a lossy dielectric-metal structure [hydrogenated amorphous silicon (a-Si:H)-aluminum (Al) structure as an example] is carried out to comprehend the factors that affect the saturation of output colors. Through the analysis, high color saturation can be realized by choosing a lossy dielectric material with an appropriate complex refractive index. However, it is quite difficult to find a dielectric material with a satisfactory complex refractive index in nature, since material properties are inherently unchangeable. Herein, we propose a new scheme by exploiting a hybrid lossy dielectric layer that comprises two thin layers of a-Si:H and magnesium hydride (
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2. Results and Discussion
2.1. Theoretical analysis of the color filter based on the lossy dielectric-metal structure
To explore the color generation mechanism of the color filter based on a lossy dielectric-metal structure and the corresponding key factors affecting the output color, a theoretical model is constructed by focusing on the influence of the complex refractive index of the lossy dielectric layer on the reflectance spectrum of the color filter. As illustrated in Fig. 1(a), the constructed color filter is composed of a lossy dielectric layer and an Al substrate. The complex refractive indices of air, the lossy dielectric layer, and the Al substrate are denoted as
Figure 1.(a) Schematic diagram of the color filter based on a lossy dielectric-metal structure; (b) reflectance spectra and chromaticity coordinates with increasing n2 for a fixed k2 of 0.6; (c) reflectance spectra and chromaticity coordinates with increasing k2 for a fixed n2 of 4; (d) color palettes with varying n2 and k2.
By Snell’s law, the angle
According to the above equations, the reflectivity of the lossy dielectric-metal structure is closely related to the complex refractive index of the lossy dielectric layer. To understand the effect of its complex refractive index on the total reflectivity, we calculate the reflectivity when the real part
2.2. Proposed ultrathin color filter with enhanced color saturation exploiting EMT
As a-Si:H features an ultrahigh real part of the complex refractive index in the visible region, we consider using it as the lossy dielectric layer. Figure 2(a) shows the complex refractive index of a-Si:H and the simulated reflectance spectra of the a-Si:H-Al structure using a finite-difference time-domain (FDTD) method-based tool. The thickness of the a-Si:H layer is determined to be 10, 19, and 26 nm to create the subtractive primary colors of cyan, magenta, and yellow (CMY), respectively. Except for the magenta filter, both the yellow and cyan filters have relatively high reflectivity at the resonance wavelengths. Such a low suppression ratio in the reflectance spectra inevitably forms low color saturation. The reason is that the imaginary part of the complex refractive index of a-Si:H is much larger than the desired
Figure 2.(a) Complex refractive index of a-Si:H and MgH2 and reflectance spectra of CMY filters based on the a-Si:H-Al structure; (b) equivalent conversion relationship between hybrid lossy and quasi-homogeneous dielectric layer based on EMT; (c) calculated effective complex refractive indices of the MgH2-a-Si:H layer with different thicknesses of MgH2.
To enhance the color saturation of the cyan and yellow filters, the imaginary part of the lossy dielectric layer is required to be elaborately adjusted in the targeted wavelength range. Here, we take advantage of EMT to effectively tune the complex refractive index of the lossy dielectric layer, in which EMT refers to a theoretical model indicating that two stacked dielectric layers with ultrathin thicknesses can be equivalent to a quasi-homogeneous dielectric layer with an effective complex refractive index. As illustrated in Fig. 2(b), a dual-layer structure comprising a dielectric layer 1 (thickness of
According to Eq. (4), it is easy to find that the effective complex refractive index
According to our theoretical studies, the lossy dielectric layer should have a large
Figure 3.(a) Reflectance spectra and chromaticity coordinates of yellow and cyan filters without and with the MgH2 layer in different stacking cases; (b) color gamut of the structure based on a single a-Si:H layer and the proposed structure.
Figure 3(a) shows the simulated reflectance spectra and corresponding CIE 1931 chromaticity coordinates of the yellow and cyan filters with 4-nm thick
Figure 4(a) illustrates the angular responses of the proposed CMY filters for s-, p-polarized, and unpolarized incident light, respectively. Here, the hybrid lossy dielectric layer of the magenta filter is composed of a 6-nm thick
Figure 4.(a) Reflectance spectra of CMY filters under s-, p-polarized, and unpolarized light illumination when the incident angle increases; (b) schematic diagram of the phases involved in two cases based on different combination orders of MgH2 and a-Si:H lossy dielectric layers; (c) propagation and reflection phases of the CMY filters as a function of the incident angle under s- and p-polarized light illumination.
Furthermore, the underlying mechanism in regard to the obtained large angular tolerance of the proposed color filter is scrutinized by calculating the phase changes under different incident angles. We inspect two structures, as shown in Fig. 4(b), including Case 1 for a-Si:H as layer 1 and
2.3. Dynamic color tuning property
The proposed color filter has the potential to render dynamic color tuning property, as the contained
Figure 5.(a) Schematic diagram of the proposed color filter with regard to the dynamic interconversion in the top layer between MgH2 and Mg; reflectance spectra and corresponding chromaticity coordinates of (b) the cyan filter and (c) the magenta filter when the top layer of MgH2 is converted to Mg.
To further verify the dynamic color tuning property, the reflectance spectra and corresponding CIE 1931 chromaticity coordinates before and after conversion of the top
3. Conclusion
In conclusion, a high-performance ultrathin color filter is proposed by exploiting an EMT-based
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