- Chinese Optics Letters
- Vol. 22, Issue 9, 091301 (2024)
Abstract
1. Introduction
The integration of two-dimensional (2D) materials, such as graphene and transition metal dichalcogenides (TMDCs) with photonic integrated circuits, has been emerging for applications in optical modulation[1], detection[2,3], and nonlinear signal processing[4,5], owing to the unique optical and electronic properties[6,7] of 2D materials, the giant interaction between 2D materials and light in waveguide devices[8,9], as well as the CMOS-compatible device fabrication processes. is a newly discovered group-ten TMDC with a tunable bandgap, the carrier mobility of more than [10], and stable physical and chemical properties[11,12], which makes promising for various optoelectronic applications[7,12]. To date, waveguide-integrated devices have been explored for optoelectronic applications of light modulation[13] and photodetection[14,15].
On the other hand, optical bistability can be used to construct all-optical switches, optical memories, and all-optical logic gates, which are believed to break through the bottleneck of information exchange in future communication and computing systems, playing a crucial role as the core of the next-generation communication and signal processing systems[16]. Optical bistability was realized in silicon waveguide devices at the beginning of this century[17]. To further enhance the on-chip optical bistability, graphene-on-waveguide structures have been applied for developing bistable devices. For example, by integrating graphene on the waveguide-integrated Fabry–Perot resonator[18] and microring resonator (MRR)[19], the photo-induced joule heating in graphene can lead to enhanced effective thermal nonlinear index compared with the bare silicon waveguides. Besides, optical bistability with low input power requirement induced by the Kerr effect in graphene has been theoretically studied in the graphene-on-silicon slot MRR[20]. However, the optical bistability has seldom been reported based on waveguide-integrated devices.
In this paper, we studied an integrated nonlinear optical device based on 2D few-layer -on-silicon nitride MRR. We measured the transmission spectra of the silicon nitride MRRs before and after covering the film and calculated the absorption coefficients of the fabricated devices. We selected a representative device to measure its transmission curve while gradually increasing the optical power. The resonance shifts to longer wavelengths linearly with the input power, and a clear optical bistability effect was observed. In addition, we used the time-domain coupled mode theory (CMT) to simulate the thermo-optic effect in the device, which agrees well with the experimental results. The subsequent finite-element method (FEM) simulation also shows that the integration of greatly enhances the photo-thermal conversion in the waveguide device. This study is expected to provide a useful reference for developing subsequent nonlinear devices for all-optical signal processing applications.
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2. Results and Discussion
We designed and fabricated the -on-silicon nitride MRR based on the standard nanofabrication technology and home-developed wet-transfer method. We first fabricated silicon nitride MRRs using electron beam lithography and inductively coupled plasma-deep reactive ion etching (ICP-DRIE). The low-pressure chemical vapor deposited (CVD) top silicon nitride layer is 720 nm thick (H1), the buried oxide (BOX) is 4 µm thick (H3), and the etching depth of the silicon nitride layer is 400 nm (H2), as shown in Fig. 1. The gap between the bus waveguide and the microring is 390 nm (g). The width of the waveguide (W) and the diameter (D) of the MRR are 1.2 and 200 µm, respectively. A pair of focusing one-dimensional grating couplers is used for the fiber-to-waveguide optical coupling. Next, we covered the MRR with commercial CVD-grown five-layer film on the sapphire substrate (Six Carbon Technology Shenzhen). To transfer the material, a layer of polymethyl methacrylate (PMMA) was spin-coated on the surface of the sample, and the PMMA layer was heated and cured to form a solid protection layer. Then the sample was immersed in the KOH solution to separate the PMMA-on- layer from the sapphire substrate. After cleaning in the deionized water, the PMMA-on- layer was transferred onto the silicon nitride chip. Then the chip was dried in the air. Finally, the PMMA was removed with an acetone solution. The flowchart for the fabrication process is shown in Fig. S1 in the Supplementary Material.
Figure 1.Schematic of the PtSe2-on-silicon nitride MRR. (a) Three-dimensional view of the device; (b) top view of the device; (c) cross-sectional view of the waveguide.
Next, we characterized the five-layer film on the surface of the silicon nitride chip. The thickness of the film was measured to be using atomic force microscopy (AFM), as shown in Fig. 2(a). Figure 2(b) shows the Raman spectrum of the film on the surface of the silicon nitride chip. Three major Raman peaks appeared at 177, 206, and , related to the , , and LO vibration modes of Se atoms, respectively, and the locations of Raman peaks were consistent with the previous report[21]. X-ray photoelectron spectroscopy (XPS) analysis was also performed to characterize the film further. As shown in Fig. 2(c), C, O, Pt, and Se peaks mainly existed in the film. The peaks of and come from the air absorbed by the surface of the film. Two peaks of 72.72 and 76.02 eV corresponding to Pt and Pt were obtained by Gaussian fitting of the Pt 4f peak, as shown in Fig. 2(d). The fitting of the Se 3d peak in Fig. 2(e) also results in two main peaks located at 54.02 and 54.88 eV, corresponding to Se and Se . The atomic numbers of Pt and Se were calculated based on the measured spectra, as shown in the inset table of Fig. 2(c), which was consistent with the theoretical values[21].
Figure 2.Characterization of the five-layer PtSe2 on the surface of the silicon nitride chip. (a) The AFM characterization of the PtSe2 film; (b) the Raman spectrum of the PtSe2 film measured using a Raman spectrometer with a pump wavelength of 785 nm; (c) the measurement result of the XPS full spectrum; the Gaussian fitting curves of (d) Se 3d peak and (e) Pt 4f peak in (c).
Next, we characterized the optical absorption of the -on-silicon nitride MRRs. The scanning electron microscopy (SEM) images of the devices are shown in Figs. 3(a) and 3(d). The wet-transfer process resulted in film breakages on the MRRs. The material-covered lengths on the MRRs were estimated at 125 µm [Fig. 3(a)] and 471 µm [Fig. 3(d)] from the contrast of the images. For the MRR in Fig. 3(a), from the Lorentz fittings of the full width at half-maximum (FWHM) of the measured resonance () spectra in Figs. 3(b) and 3(c), the factor is obtained as , with 12,300 and 5800 before and after the film coverage. The transmission spectra of the MRR in Fig. 3(d) before and after the film integration are shown in Figs. 3(e) and 3(f). The quality () factor decreases from 16,000 to 2500 after the film integration. Combined with the estimated film covered length, and the measured transmission spectra before and after the film integration, the optical absorption coefficients of the -on-silicon nitride waveguide were calculated[22] as 172 dB/cm [Fig. 3(a)] and 171 dB/cm [Fig. 3(d)]. The resonances have redshifts after the film integration due to the effective refractive index change induced by the film. We also simulated the optical absorption coefficient of the -on-silicon nitride waveguide to be , using the FEM simulator (COMSOL Multiphysics) with the complex dielectric constant of the five-layer in the previous study[21], which was measured using the spectroscopic ellipsometry method. The simulation result agrees well with the experimental estimation.
Figure 3.Characterization of the PtSe2-on-silicon nitride MRRs. (a) and (d) the SEM images of two MRRs with the PtSe2 film coverage, with estimated lengths of the material covered of 125 and 471 µm. (b) and (c) The transmission spectra of the MRR in (a) before and after the PtSe2 film transfer; (e) and (f) the transmission spectra of the MRR in (d) before and after the PtSe2 film transfer.
To measure the nonlinear property of the fabricated device, we set up an experimental system, as shown in Fig. 4(a). We used a variable optical attenuator (VOA) to vary the input optical power, and the 1% output of the 1:99 optical coupler to monitor the input power with a power meter (PM1). The coupling efficiency of the grating coupler at 1550 nm wavelengths is . The input power in the following experiment refers to the optical power coupled into the bus waveguide from the grating coupler. We chose the device shown in Fig. 4(a) for the optical-bistability exploration. We started by setting the output power of the erbium-doped fiber amplifier (EDFA) to a high value that the device can withstand, while the VOA attenuation was set to the maximum attenuation. In this way, we can start the measurement at a low input power, ensuring a stable and continuous tuning of the input power. The measured transmission spectra for different input powers are shown in Fig. 4(b). As the input power increases, the resonance shifts to longer wavelengths, with a linearly fitted slope of , as shown in Fig. 4(c). In addition, as the optical power increases, the resonance curve is no longer symmetrical, and eventually, there is a significant power jump on the longer wavelength side, which indicates the emergence of the bistable state.
Figure 4.Optical nonlinearity measurement and simulation results. (a) Schematic of the experimental setup; (b) measured transmission spectra at different input power levels; (c) resonant wavelengths at different input powers; (d) simulated transmission spectra at different input powers using the time-domain CMT method; (e) simulated resonant wavelengths at different input powers; (f)–(h) hysteresis loop simulations for the input wavelengths of 1541.55, 1541.56, and 1541.57 nm; arrows in (f)–(h) indicate the directions of the input power variations.
To further evaluate the nonlinear effect in the -on-silicon nitride MRR, we used the time-domain CMT[23,24] method to calculate the energy distribution () in the microring cavity with the input power in the bus waveguide () and the transmission spectrum of the MRR (). We established the CMT model as follows[25,26]:
Parameter | Value | Source |
---|---|---|
Q0 | 5800 | [Measurement] |
Qext | 40324 | [Measurement, CMT[ |
Qinst | 6774 | [Measurement, CMT[ |
τlinear (s) | 1.6 × 10−9 | [Measurement, CMT[ |
R (K/mW) | 105 | [Measurement, CMT[ |
n0 | 1.9965 | [Reference[ |
n2 (m2/W) | 2.6 × 10−19 | [Reference[ |
ng | 2.05 | [FDTD simulation] |
V (m3) | 8.4754 × 10−16 | [FDTD simulation] |
∂n/∂T (1/K) | 2.51 × 10−5 | [Reference[ |
Table 1. Parameters and Sources Used in CMT Simulation
Finally, we performed a simulation of the photothermal effect in the waveguide using the FEM simulator (COMSOL Multiphysics) with the electromagnetic heating module. We modeled the waveguide cross section and simulated the cases with and without the film integration. In the simulation, the electromagnetic loss was used as the heat source for heat transfer calculations, and then the temperature distribution can be obtained. We gave the model an initial input light source of about 30 mW and set the ambient temperature to 293.15 K. The thermal conductivities of air, silicon nitride, , and BOX were chosen as 0.026, 29, 51[32], and , respectively. The conductivity of film was set to [33]. The simulation results are shown in Fig. 5. The average temperature of the waveguide region is about 366.2 K, which is a significant improvement compared with the case of bare silicon nitride waveguide with an average temperature of 297.9 K. This result also indicates that the application of film can enhance the photothermal conversion in the waveguide. The results demonstrate the application and potential of -based bistable devices in all-optical signal processing.
Figure 5.Electromagnetic thermal simulation results of the waveguide cross section. Temperature distributions of (a) the PtSe2-on-silicon nitride waveguide cross section and (b) the bare waveguide cross section.
3. Conclusion
In summary, we have studied the optical bistability in the five-layer -on-silicon nitride MRR. The absorption coefficient of the -on-silicon nitride waveguide was obtained from the transmission spectra of the MRR with/without film coverage at the low input optical power. By increasing the input power, the resonance of the -on-silicon nitride MRR has redshifts, and the transmission spectrum becomes unsymmetrical, showing the optical bistability. We have also theoretically studied the nonlinear effects in the device by developing the time-domain CMT method; the results were consistent with the measurement results. In addition, the FEM simulation also shows that the addition of the five-layer film significantly enhances the photothermal conversion in the waveguide device. The results obtained in this study provide some references to the combination of with waveguide devices and its mechanism of action, which will help us to advance the application of TMDC thin-film materials in integrated photonics, as well as provide a new direction of exploration for integrated optoelectronic devices.
References
[17] V. R. Almeida, M. Lipson. Optical bistability on a silicon chip. Opt. Lett., 29, 2387(2004).
[23] H. A. Haus. Waves and fields in optoelectronics. Prentice-Hall Series in Solid State Physical Electronics, 402(1984).
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