• Optoelectronics Letters
  • Vol. 9, Issue 3, 189 (2013)
Cheng-lu TIAN, Xiao-wei LI*, and Ming CHANG
Author Affiliations
  • Tianjin Key Laboratory of Thin Film Electronic and Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin 300384, China
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    DOI: 10.1007/s11801-013-2430-y Cite this Article
    TIAN Cheng-lu, LI Xiao-wei, CHANG Ming. Adjustment of residual stress and intermediate layer to BDD/porous Ti composite membrane[J]. Optoelectronics Letters, 2013, 9(3): 189 Copy Citation Text show less
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    TIAN Cheng-lu, LI Xiao-wei, CHANG Ming. Adjustment of residual stress and intermediate layer to BDD/porous Ti composite membrane[J]. Optoelectronics Letters, 2013, 9(3): 189
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