Some key technologies on soft X-ray and Extreme Ultraviolet(EUV)optics developed at CIOMP are reviewed in this paper.The technology for laser-produced plasma sources is described and a laser-produced plasma source with a liquid target worked at wavelength range of 6～22 nm has been developed.Soft X-ray and EUV photon-counting imaging is introduced and a two-dimensional photoncounting detector with position sensitive anode is fabricated.The active area of the detector is 25 mm in diameter and the resolution is 0.3 mm.The technology of super-smooth mirror fabrication is studied and a polishing machine has been developed to fabricate the super-smooth surface mirrors with the roughness and the figure of 0.6 nm(RMS)and 6 nm(RMS),respectively.Soft X-ray and EUV multilayer film technologies are coverd also in the paper and a number of mutilayer coating mirrors have been deposited for some space science projects.These multilayer mirrors show their reflectivity of 60% at 13 nm and the uniformity better than±2.5% across a 150 mm diameter.The soft X-ray and EUV radiometric technologies are studied and a reflectometer,with operational wavelength range of 5～50 nm,spectrum resolution of 0.2 nm and repeatability better than 1% has been set up.Based on a cutting-edge technology,an EUV imager and a space EUV solar telescope are developed.these imaging instruments have played an important role in a number of scientific projects.