• Piezoelectrics & Acoustooptics
  • Vol. 46, Issue 3, 296 (2024)
XU Yang1,2, SI Meiju1,2, WU Gaomi2,3, LIU Wenyi1,2..., GONG Lele2,3, ZHEN Jingyi1,2, YU Qi2,3 and CHEN Jinlin1,2|Show fewer author(s)
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.11977/j.issn.1004-2474.2024.03.003 Cite this Article
    XU Yang, SI Meiju, WU Gaomi, LIU Wenyi, GONG Lele, ZHEN Jingyi, YU Qi, CHEN Jinlin. The Study of Based on Back Cavity Etching and Lateral Exciting Film Bulk Acoustic Resonator[J]. Piezoelectrics & Acoustooptics, 2024, 46(3): 296 Copy Citation Text show less

    Abstract

    With rapid development in mobile technology, film bulk acoustic resonators have developed in a high frequency and wide bandwidth direction.This study focuses on the technological process of back cavity etching and a lateral exciting film bulk acoustic resonator on the POI (LiNbO3/SiO2/Si).On the study of the IDT optical lithography, etching and back cavity corrosion, the critical process parameters are determined.The frequency response curve shows that resonance and antiresonance frequencies were 4 565 and 5 035 MHz, respectively.The effective electromechanical coupling coefficient was 20.86%, which is significant for research on high frequency and wide bandwidth film bulk acoustic resonators.
    XU Yang, SI Meiju, WU Gaomi, LIU Wenyi, GONG Lele, ZHEN Jingyi, YU Qi, CHEN Jinlin. The Study of Based on Back Cavity Etching and Lateral Exciting Film Bulk Acoustic Resonator[J]. Piezoelectrics & Acoustooptics, 2024, 46(3): 296
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