• Laser & Optoelectronics Progress
  • Vol. 62, Issue 5, 0514002 (2025)
Lixian Xie1,2,*, Yanfeng Gao1,2, and Hua Zhang1,2
Author Affiliations
  • 1School of Mechanical Engineering, Shanghai University of Engineering Science, Shanghai 201620, China
  • 2Shanghai Collaborative Innovation Center for Intelligent Manufacturing Robot Technology for Large-Scale Components, Shanghai 201620, China
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    DOI: 10.3788/LOP241529 Cite this Article Set citation alerts
    Lixian Xie, Yanfeng Gao, Hua Zhang. Molecular Dynamics Simulation of Damage in Femtosecond Laser Processing of Al2O3 Ceramic Materials[J]. Laser & Optoelectronics Progress, 2025, 62(5): 0514002 Copy Citation Text show less

    Abstract

    To explore the physical mechanism of femtosecond laser processing, this paper discusses the mechanism of microscopic damage formation on Al2O3 ceramic materials under femtosecond laser irradiation. By combining molecular dynamics and continuous equation simulation methods, the ablation phenomenon caused by femtosecond laser on Al2O3 ceramics is analyzed. The movement of atoms on the surface of Al2O3 ceramics under femtosecond laser irradiation is compared below and above the ablation threshold, studying the changes in internal temperature, particle number, and pressure of Al2O3 ceramics. The results show that when the energy density is higher than the ablation threshold, the target material is fractured under the combined action of temperature and pressure, with the ablation and melting primarily being affected by the heat input time. The research results provide theoretical guidance for the precise processing of dielectric materials with femtosecond laser.