• Optics and Precision Engineering
  • Vol. 30, Issue 10, 1181 (2022)
Yijie LI, Jun XIAO, Yifang CHEN*, Xujie TONG, and Chengyang MU
Author Affiliations
  • Nanolithography and Application Research Group, School of Information Science and Technology, Fudan University, Shanghai200433, China
  • show less
    DOI: 10.37188/OPE.20223010.1181 Cite this Article
    Yijie LI, Jun XIAO, Yifang CHEN, Xujie TONG, Chengyang MU. Grating X-ray collimator supported by Si3N4 membrane with large aspect ratio written directly by electron beam[J]. Optics and Precision Engineering, 2022, 30(10): 1181 Copy Citation Text show less
    Simulation results by ray tracing method
    Fig. 1. Simulation results by ray tracing method
    Process of making suspended Au grating
    Fig. 2. Process of making suspended Au grating
    Electroplating and sample of Au grating
    Fig. 3. Electroplating and sample of Au grating
    Images of photoresist with and without fractures
    Fig. 4. Images of photoresist with and without fractures
    Contrast images of stiffener effect
    Fig. 5. Contrast images of stiffener effect
    Simulation results and experimental results of EBL etching of different dose etching, the blue figure is the simulation result, and the gray figure is the SEM image of EBL experimental result at the same dose
    Fig. 6. Simulation results and experimental results of EBL etching of different dose etching, the blue figure is the simulation result, and the gray figure is the SEM image of EBL experimental result at the same dose
    Testing system and results of Au grating
    Fig. 7. Testing system and results of Au grating
    Yijie LI, Jun XIAO, Yifang CHEN, Xujie TONG, Chengyang MU. Grating X-ray collimator supported by Si3N4 membrane with large aspect ratio written directly by electron beam[J]. Optics and Precision Engineering, 2022, 30(10): 1181
    Download Citation