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    Journals >Chinese Optics Letters >Volume 16 >Issue 3 >Page 032201 > Article
    • Chinese Optics Letters
    • Vol. 16, Issue 3, 032201 (2018)
    Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems
    Zelong Zhou1,2,*, Hongbo Shang1, Yongxin Sui1, and Huaijiang Yang1
    Author Affiliations
  • 1Engineering Researcher Center of Extreme Precision Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/COL201816.032201 Cite this Article Set citation alerts
    Zelong Zhou, Hongbo Shang, Yongxin Sui, Huaijiang Yang, "Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems," Chin. Opt. Lett. 16, 032201 (2018) Copy Citation Text show less
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    Article index updated: Jul. 2, 2024
    Citation counts are provided from Web of Science. The counts may vary by service, and are reliant on the availability of their data.
    The article is cited by 11 article(s) from Web of Science.
    The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)
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    Zelong Zhou, Hongbo Shang, Yongxin Sui, Huaijiang Yang, "Useful way to compensate for intrinsic birefringence caused by calcium fluoride in optical lithography systems," Chin. Opt. Lett. 16, 032201 (2018)
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    Paper Information
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