Zhichao Dong, Ting Liang, Cheng Lei, Kaixun Gong, Xuezhan Wu, Lei Qi. Influence of Optical Element Heat Absorption on Focus Position of Equipment in Semiconductor Laser Processing[J]. Laser & Optoelectronics Progress, 2022, 59(1): 0114013
- Laser & Optoelectronics Progress
- Vol. 59, Issue 1, 0114013 (2022)
Fig. 1. Laser focusing system model
Fig. 2. Laser beam distribution
Fig. 3. Temperature distribution on lens surface
Fig. 4. Stress and deformation of lens
Fig. 5. Deposition power. (a) Deposition power of the lens; (b) deposition power on target surface
Fig. 6. Refractive index change of focusing lens
Fig. 7. Relationship between RMS of point size and position of focal plane. (a) Overall change curves; (b) enlargement in Fig. 7(a)
Fig. 8. Spot diagram of beam on the best focal plane
Fig. 9. Experimental device. (a) Ultraviolet laser processing equipment; (b) ultraviolet laser instrument; (c) processing platform
Fig. 10. Change of focusing spot. (a) Light spot at initial position; (b) stabilized light spot
Fig. 11. Morphologies of cutting areas. (a) Initial cutting area; (b) transition area; (c) initial stable area; (d) ending stable area
Fig. 12. Measurement results of step profiler. (a) Measuring position of step profiler; (b) step morphology
Fig. 13. Morphologies of transition area. (a) 2D morphology; (b) 3D morphology
Fig. 14. Processing depth (ten times). (a) Initial cutting area; (b) stable area
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