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    Journals >Laser & Optoelectronics Progress >Volume 52 >Issue 8 >Page 81703 > Article
    • Laser & Optoelectronics Progress
    • Vol. 52, Issue 8, 81703 (2015)
    Research of Oxidative Stress Reaction Induced by 635nm/808nm Double Wavelength Low Level Laser Therapy on CCC-ESF
    Chen Hongli1,*, Wang Hong1, Wang Chao2, Yin Huijuan1..., Jin Wendong1, Mu Zhiming1 and Li Yingxin1|Show fewer author(s)
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    DOI: 10.3788/lop52.081703 Cite this Article Set citation alerts
    Chen Hongli, Wang Hong, Wang Chao, Yin Huijuan, Jin Wendong, Mu Zhiming, Li Yingxin. Research of Oxidative Stress Reaction Induced by 635nm/808nm Double Wavelength Low Level Laser Therapy on CCC-ESF[J]. Laser & Optoelectronics Progress, 2015, 52(8): 81703 Copy Citation Text show less
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    Article index updated: Mar. 17, 2025
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    Chen Hongli, Wang Hong, Wang Chao, Yin Huijuan, Jin Wendong, Mu Zhiming, Li Yingxin. Research of Oxidative Stress Reaction Induced by 635nm/808nm Double Wavelength Low Level Laser Therapy on CCC-ESF[J]. Laser & Optoelectronics Progress, 2015, 52(8): 81703
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