Optical filter are an important optical device which can filter impurity light interference, and the filters with different wavelength bands are widely used in genetic detection. Based on the theory of film system design and film preparation process, by using the technology of electron- beam evaporation- ion- assisted deposition, with Ta2O5 and SiO2 as the coating materials, a high-transmission long-wavelength pass filter at the cut-off center λ0=520nm high reflection and transmission band λ=530~750 nm on the substrate JGS 1 glass is designed and prepared. By analyzing the membrane layer sensitivity and electric field distribution, a rational crystal control scheme is setted and the process parameters are adjusted to avoid a decrease in the quartz crystal control sensitivity when highly sensitive membrane layers are monitored, thereby, the issue of reduced spectral transmittance is resolved. The prepared filter has 99.77% reflectivity at 520 nm, 98.58% average transmittance in the band of 530~750 nm, which meets the application requirements.