Chi CHEN, Chaoyang ZHANG, Wenjie FU, Dun LU, Tongxing HUANG, Yang YAN. Electron Temperature Diagnostics in Microwave Plasma Chemical Vapor Deposition by Optical Emission Spectroscopy[J]. Acta Photonica Sinica, 2021, 50(9): 0930001
- Acta Photonica Sinica
- Vol. 50, Issue 9, 0930001 (2021)
Fig. 1. Schematic diagram of the coaxial microwave driven Plasma with Langmuir probe and emission spectroscopy
Fig. 2. The structure of the coaxial reaction cavity
Fig. 3. The spectrum of Ar plasma driven by 800 W microwave at the pressure of 80 Pa
Fig. 4. Boltzmann plot for Ar lines
Fig. 5. The microwave power and pressure against the electron temperature measured by the Langmuir probe and OES
Fig. 6. Coaxial line CH4 plasma driven by 800 W microwave at fill pressure of 80 Pa
Fig. 7. The spectrum of CH4 plasma driven by 800 W microwave at the pressure of 80 Pa
Fig. 8. The voltage and current curve of the Langmuir probe in CH4 plasma
Fig. 9. The microwave power and pressure against the electron temperature by OES
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Table 1. Spectroscopic data of chosen lines in Ar plasma［30］
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Table 2. Spectroscopic data of chosen lines in CH4 Plasma［30］
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