Wenbin LI, Shuhui LI, Liuyang PAN, Zhe ZHANG, Chun XIE, Qiushi HUANG, Zhanshan WANG. Nanosecond extreme ultraviolet radiation damage on thin film mirrors[J]. Optics and Precision Engineering, 2022, 30(21): 2698
- Optics and Precision Engineering
- Vol. 30, Issue 21, 2698 (2022)
Fig. 1. Schematic diagram of 13.5 nm extreme ultraviolet irradiation damage instrument
Fig. 2. Single-shot EUV damage probability of B4C films
Fig. 3. AFM damage morphology of B4C films induced by EUV at energy density of 2.1 J/cm2
Fig. 4. Depth distribution of absorbed energy fraction of B4C films irradiated by 13.5 nm EUV laser
Fig. 5. 13.5 nm EUV irradiation on S1， S3 and S4 samples
Fig. 6. EUV damage on Au （30 nm）/Si-sub mirror
Fig. 7. Experimental result of EUV damage on Ru（30.8 nm）/D263 and B4C（6.0 nm）/Ru（30.4 nm）/D263 samples
Fig. 8. Multi-shots EUV damage thresholds of Mo/Si multilayer varied as a function of pulse numbers and the EUV multi-shots damage probability （inserted figure）
Fig. 9. AFM damage morphologies of Mo/Si multilayer irradiated by EUV pulses： （a）-（c） Single-shot damage and （d）-（f） ten-shots damage
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