[1] Barnes W L, Dereux A, Ebbesen T W. Surface plasmon subwavelength optics[J]. Nature, 2003, 424(6950): 824-830.

[2] G Bouwhuis, J H M Spruit. Optical storage read-out of nonlinear disks[J]. Appl Opt, 1990, 29(26): 3766-3768.

[3] K Yasuda, M Ono, K Arataniet, et al.. Premastered optical disk by superresolution[J]. Jpn J Appl Phys, 1993, 32(11B): 5210-5213.

[4] Werayut Srituravanich, Nicholas Fang, Cheng Sun, et al.. Plasmonic nanolithography[J]. Nano Letters, 2004, 4(6): 1085-1088.

[5] Lina Shi, Hailiang Li, Yuchan Du, et al.. Enhanced optical transmission through asymmetric nanostructured gold films [J]. J Opt Soc Am B, 2012, 29(12): 3377-3385.

[6] Zhang Zhiyou, Du Jinglei, Li Min, et al.. Optimal design of super focusing lens configuration based on surface plasmon polariton coupling plate[J]. Acta Optica Sinica, 2009, 29(9): 2524-2528.

[7] Ozbay E. Plasmonics: merging photonics and electronics at nanoscale dimensions[J]. Science, 2006, 311(5758): 189-193.

[8] Haofei Shi, Changtao Wang, Chunlei Du, et al.. Beam manipulating by metallic nano-slits with variant widths[J]. Opt Express, 2005, 13(15): 6815-6820.

[9] Kim Seyoon, Lim Yongjun, Kim Hwi, et al.. Optical beam focusing by a single subwavelength metal slit surrounded by chirped dielectric surface gratings[J]. Appl Phys Lett, 2008, 92(1): 013103.

[10] Jianjun Chen, Chen Wang, Guowei Lu, et al.. Highly efficient nanofocusing based on a T-shape micro-slit surrounded with multi-slits[J]. Opt Express, 2012, 20(16): 17734-17740.

[11] Wu G, Chen J, Zhang R, et al.. Highly efficient nanofocusing in a single step-like microslit[J]. Opt Lett, 2013, 38(19): 3776-3779.

[12] Liu Y, Yu W. Strong intensity modulation of surface plasmon polaritons by a dielectric layer[J]. IEEE Photonic Tech Lett, 2012, 24(24): 2214-2217.

[13] Xie Changqing, Zhu Xiaoli, Niu Jiebin, et al.. Micro-and nano-metal structures fabrication technology and applications [J]. Acta Optica Sinica, 2011, 31(9): 0900128.

[14] Wang H, Groen F H, Pereira S F, et al.. Optical waveguide focusing system with short free-working distance[J]. Appl phys lett, 2003, 83(22): 4486-4487.

[15] Kobayashi N, Goto K, Wakatsuki T, et al.. Improvement of position accuracy in mask-writing electron beam lithography with a multi-pass writing strategy for reducing position errors due to resist charging[C]. SPIE, 2008, 7028: 70281Y.

[16] Duan H, Manfrinato V R, Yang J K W, et al.. Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale [J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2010, 28(6): C6H11-C6H17.