For the requirements of an embedded focused imaging telescope in eXTP (enhanced X-ray Timing and Polarization satellite) for W/Si multilayers on a cylindrical mirror， W/Si multilayers were fabricated at a grazing incident angle of 0.5 ° and working range of 1—30 keV， and multilayer fabrication technologies were optimized. Firstly， separator plates and masks were mounted to collimate the sputtering particles to optimize different background pressures and working gas pressures in the deposition process and to improve the quality of periodic multilayers. Then， a novel kind of revolution speed curve was designed for controlling the thickness to make the layer thickness be uniform at the mirror axes. The separator plates were mounted on the mounting plate on both sides of the mirror to make the different axis thicknesses be equal. Finally， the depth-graded structure was designed by using the power law expression， a sample was prepared and measured in Beijing Synchrotron Radiation Facility (BSRF) and the measured results are identical with that of design theory. By optimized multilayer fabrication technologies， a multilayer with a d-spacing of 3.8 nm， thickness ratio of tungsten of 0.47 and the total number of bilayers of 80 was fabricated. The results show that the interfacial roughness of the multilayer is only 0.29 nm and the layer thickness variation on the cylindrical mirror has been controlled less than 3%. The measurement indicates that depth-graded multilayer can meet the requirements of the embedded focused imaging telescope in eXTP mission for layer quality， layer thickness uniform and energy spectral response.