• Laser & Optoelectronics Progress
  • Vol. 62, Issue 3, 0314009 (2025)
Xubin Chen*, Xiulan Ling, and Zhicong Shao
Author Affiliations
  • School of Information and Communication Engineering, North University of China, Taiyuan 030051, Shanxi , China
  • show less
    DOI: 10.3788/LOP241292 Cite this Article Set citation alerts
    Xubin Chen, Xiulan Ling, Zhicong Shao. Laser Protective Thin Films Based on Vanadium Dioxide Phase Transition Characteristics[J]. Laser & Optoelectronics Progress, 2025, 62(3): 0314009 Copy Citation Text show less
    Schematic diagram of laser incident film system under different states. (a) Dielectric phase; (b) metal phase
    Fig. 1. Schematic diagram of laser incident film system under different states. (a) Dielectric phase; (b) metal phase
    Change of transmittance of single layer vanadium dioxide with thickness of film
    Fig. 2. Change of transmittance of single layer vanadium dioxide with thickness of film
    Structure distribution of multilayer film system
    Fig. 3. Structure distribution of multilayer film system
    Function of temperature and time under different pulse intensities under constant pulse duration τ=60 ps
    Fig. 4. Function of temperature and time under different pulse intensities under constant pulse duration τ=60 ps
    Temperature distribution diagram
    Fig. 5. Temperature distribution diagram
    Functional relationship between temperature and time of VO2
    Fig. 6. Functional relationship between temperature and time of VO2
    Functional relationship between VO2 metal phase fraction, refractive index, and temperature
    Fig. 7. Functional relationship between VO2 metal phase fraction, refractive index, and temperature
    Temperature and transmittance as a function of time when multiple pulse excitation films are applied
    Fig. 8. Temperature and transmittance as a function of time when multiple pulse excitation films are applied
    Comparison of transmittance of film system before and after refractive index optimization
    Fig. 9. Comparison of transmittance of film system before and after refractive index optimization
    ParameterAl2O315VO215Au14SiO2MgF2
    ρ/(kg/m3395043401930022003180
    KT/[W/(m·K)]2563171.43.3
    CP/[J/(kg·K)]775696129695768
    Table 1. Simulation parameters of materials