In chemical mechanical polishing by a fixed-abrasive pad, the hydrolysis between workpiece and slurries will form a softened layer on the glass substrate to effect on the Material Removal Rate (MRR) and surface quality. The influence of polishing slurries on the surface hardness of decorative glass is analyzed by the micro-hardness method in this paper. The effects of different slurries and temperatures on the MRR were investigated using a CP-4 lapping and polishing platform. Both the dynamic Acoustic Emission (AE) and Coefficient of Friction (COF) were continuously monitored in-situ during the polishing process. The results show that the network structure on the decorative glass surface is collapsed when the sodium hexametaphosphate was added to the slurries, and this layer is softer than the glass, which improved the material removal rate. With the temperature increased, the hydrolysis effect is more obviously. Direct real-time monitoring of AE and COF can offer constructive significance for optimizing process parameters of polishing.