Researching

Journals
  • Advanced Photonics
  • Photonics Insights
  • Advanced Photonics Nexus
  • Photonics Research
  • Advanced Imaging
  • View All Journals
  • Chinese Optics Letters
  • High Power Laser Science and Engineering
    • Articles
  • Optics
  • Physics
  • Geography
  • View All Subjects
    • Conferences
  • CIOP
  • HPLSE
  • AP
  • View All Events
    • News
    About CLP
    Search by keywords or author
    Journals >Laser & Optoelectronics Progress >Volume 52 >Issue 4 >Page 41602 > Article
    • Laser & Optoelectronics Progress
    • Vol. 52, Issue 4, 41602 (2015)
    Range Analysis of Thermal Stress and Displacement of GaN films on Al2O3 Substrate
    Wang Xiaozeng*
    Author Affiliations
  • [in Chinese]
    • show less
    DOI: 10.3788/lop52.041602 Cite this Article Set citation alerts
    Wang Xiaozeng. Range Analysis of Thermal Stress and Displacement of GaN films on Al2O3 Substrate[J]. Laser & Optoelectronics Progress, 2015, 52(4): 41602 Copy Citation Text show less
    Cited By
    Article index updated: Mar. 24, 2025
    The article is cited by 6 article(s) CLP online library. (Some content might be in Chinese.)
    Abstract
    Get PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (17)
    Cited By (6)
    Get Citation
    Copy Citation Text
    Wang Xiaozeng. Range Analysis of Thermal Stress and Displacement of GaN films on Al2O3 Substrate[J]. Laser & Optoelectronics Progress, 2015, 52(4): 41602
    Download Citation
    Set citation alerts for the article
    Tools
    Share
    Set citation alerts for the article
    Save the article for my favorites
    Paper Information
    Recommended Topics
    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology