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    Journals >Laser & Optoelectronics Progress >Volume 53 >Issue 4 >Page 42302 > Article
    • Laser & Optoelectronics Progress
    • Vol. 53, Issue 4, 42302 (2016)
    Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold
    Wu Xiaoming1,*, Li Xin1, Wang Yijian1, and Jiao Hongfei2
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  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/lop53.042302 Cite this Article Set citation alerts
    Wu Xiaoming, Li Xin, Wang Yijian, Jiao Hongfei. Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold[J]. Laser & Optoelectronics Progress, 2016, 53(4): 42302 Copy Citation Text show less
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    Article index updated: Mar. 17, 2025
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    Wu Xiaoming, Li Xin, Wang Yijian, Jiao Hongfei. Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold[J]. Laser & Optoelectronics Progress, 2016, 53(4): 42302
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