Researching

Journals
  • Advanced Photonics
  • Photonics Insights
  • Advanced Photonics Nexus
  • Photonics Research
  • Advanced Imaging
  • View All Journals
  • Chinese Optics Letters
  • High Power Laser Science and Engineering
    • Articles
  • Optics
  • Physics
  • Geography
  • View All Subjects
    • Conferences
  • CIOP
  • HPLSE
  • AP
  • View All Events
    • News
    About CLP
    Search by keywords or author
    Journals >Laser & Optoelectronics Progress >Volume 53 >Issue 4 >Page 42302 > Article
    • Laser & Optoelectronics Progress
    • Vol. 53, Issue 4, 42302 (2016)
    Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold
    Wu Xiaoming1,*, Li Xin1, Wang Yijian1, and Jiao Hongfei2
    Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    DOI: 10.3788/lop53.042302 Cite this Article Set citation alerts
    Wu Xiaoming, Li Xin, Wang Yijian, Jiao Hongfei. Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold[J]. Laser & Optoelectronics Progress, 2016, 53(4): 42302 Copy Citation Text show less
    Cited By
    Article index updated: Mar. 18, 2025
    The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)
    Abstract
    Get PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (16)
    Cited By (1)
    Get Citation
    Copy Citation Text
    Wu Xiaoming, Li Xin, Wang Yijian, Jiao Hongfei. Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold[J]. Laser & Optoelectronics Progress, 2016, 53(4): 42302
    Download Citation
    Set citation alerts for the article
    Tools
    Share
    Set citation alerts for the article
    Save the article for my favorites
    Paper Information
    Recommended Topics
    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology