• Acta Photonica Sinica
  • Vol. 35, Issue 8, 1194 (2006)
Zhu Huiqun1,*, Ding Ruiqin1, and Hu Yi2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    Zhu Huiqun, Ding Ruiqin, Hu Yi. Hydrogen Passivation Effect on GaAs Thin Films[J]. Acta Photonica Sinica, 2006, 35(8): 1194 Copy Citation Text show less

    Abstract

    13~20 nm monolayer high quality GaAs thin films have been deposited by radio frequency (RF) magnetron sputtering technique in the atmosphere with hydrogen. The effect of hydrogen passivation on the micro-structure and optical properties of GaAs films was reported. The GaAs thin films were studied by X-ray diffraction,atomic force microscope pattern,absorption and photoluminescence (PL) spectrum.Experimental results show that the GaAs thin films have fcc zinc-blende structure,larger the granular size and more coarseness morphology,when the substrate temperature is at 500℃~520℃ with hydrogen or at 520℃ without hydrogen,a clear exciton hump and blue shift phenomenon were observed in the absorption spectra as well as a stronger peak were found in the PL spectra. These results indicate that hydrogen has passivation effect on GaAs thin films significantly.