• Laser & Optoelectronics Progress
  • Vol. 62, Issue 5, 0512002 (2025)
Huiyun Wang*, Shuaikang Jiang, Shen Wei, Xuewei Du, and Qiuping Wang
Author Affiliations
  • National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230026, Anhui , China
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    DOI: 10.3788/LOP241261 Cite this Article Set citation alerts
    Huiyun Wang, Shuaikang Jiang, Shen Wei, Xuewei Du, Qiuping Wang. High-Precision Flexible Hinge Rotation Stage for Stitching Interference System of Mirror[J]. Laser & Optoelectronics Progress, 2025, 62(5): 0512002 Copy Citation Text show less
    Schematic of sub-aperture stitching
    Fig. 1. Schematic of sub-aperture stitching
    Schematic of hinge
    Fig. 2. Schematic of hinge
    Schematic of two-dimensional rotation stage. (a) Three-dimensional schematic diagram; (b) pitch; (c) roll; (d) schematic of sinusoidal drive
    Fig. 3. Schematic of two-dimensional rotation stage. (a) Three-dimensional schematic diagram; (b) pitch; (c) roll; (d) schematic of sinusoidal drive
    First-order mode of rotation stage
    Fig. 4. First-order mode of rotation stage
    Layout of modal testing measuring points
    Fig. 5. Layout of modal testing measuring points
    Bode diagram
    Fig. 6. Bode diagram
    Stability of rotation stage. (a) Pitch direction; (b) roll direction
    Fig. 7. Stability of rotation stage. (a) Pitch direction; (b) roll direction
    Resolution measurement result of rotation stage. (a) Pitch direction; (b) roll direction
    Fig. 8. Resolution measurement result of rotation stage. (a) Pitch direction; (b) roll direction
    Attitude measurement result for pitch directional. (a) Rotation angle of rotation stage; (b) aperture attitude parameters
    Fig. 9. Attitude measurement result for pitch directional. (a) Rotation angle of rotation stage; (b) aperture attitude parameters
    Attitude measurement result for roll directional. (a) Rotation angle of rotation stage; (b) aperture attitude parameters
    Fig. 10. Attitude measurement result for roll directional. (a) Rotation angle of rotation stage; (b) aperture attitude parameters
    Stitching interference instrument. (a) System diagram; (b) physical diagram
    Fig. 11. Stitching interference instrument. (a) System diagram; (b) physical diagram
    Tested mirror
    Fig. 12. Tested mirror
    Comparison of stitching middle line and LTP. (a) Comparison of surface height; (b) comparison of slope
    Fig. 13. Comparison of stitching middle line and LTP. (a) Comparison of surface height; (b) comparison of slope
    OrderNatural frequency (test) /HzNatural frequency (simulation) /HzError /%
    148.60048.8410.50
    295.40192.1453.41
    399.40199.7580.34
    4109.601105.7303.53
    Table 1. Simulation and experimental results and errors
    Specification21-0014-M3
    Surface shapeplane
    MaterialMono-Si〈100〉
    Dimensions (L×W×H) /(mm×mm×mm)380×50×50
    Clear aperture (L×W) /(mm×mm)360×40
    Tangential radius /km>100
    Sagittal radius /km>30
    Tangential slope /μrad0.82 (RMS)
    Sagittal slope /μrad1.5 (RMS)
    Surface roughness /nm<0.16 (RMS)
    Table 2. Mirror parameters
    InstrumentMiddle line surface heightMiddle line slope
    RMS /nmPV /nmRMS /μradPV /μrad
    Stitching19.2176.740.553.49
    LTP20.6492.310.593.39
    Residual7.4022.720.331.78
    Table 3. Comparison of stitching middle line and LTP parameters
    Huiyun Wang, Shuaikang Jiang, Shen Wei, Xuewei Du, Qiuping Wang. High-Precision Flexible Hinge Rotation Stage for Stitching Interference System of Mirror[J]. Laser & Optoelectronics Progress, 2025, 62(5): 0512002
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