Ming TANG, Shuang LU, Zhanglin HU, Shuhui LI, Chao YUN, Yinzhuo HU, Jie CHEN, Wenbin LI, Zhanshan WANG. Molecular Dynamics Study of the Temperature Effects on Damage Mechanisms of Ni Films Irradiated by Extreme Ultraviolet Free-electron Laser[J]. Acta Photonica Sinica, 2024, 53(11): 1131002
- Acta Photonica Sinica
- Vol. 53, Issue 11, 1131002 (2024)
Fig. 1. Model diagram of TTM-MD method
Fig. 2. The relationship between the melting threshold and the initial temperature of Ni films （50 nm），the dashed line represents the extension of the fitted solid line
Fig. 3. Atomic snapshots at 19 ps for initial temperatures of 300 K，900 K，and 1 300 K with red marked atoms in a molten state and dark blue marked atoms in a crystalline state
Fig. 4. The temperature distribution diagram of Ni film （50 nm） at different initial temperature when melting damage occurs，the purple marked area represents the melting area
Fig. 5. The stress distribution diagram of Ni film （50 nm） at different initial temperature when melting damage occurs，the purple marked area represents the melting area
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Table 0. The overheating ratio of the homogeneous nucleation region at different initial temperatures and the average heating rate in the middle （24~26 nm） region of the film
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Table 0. Simulation parameters of TTM-MD
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