In this study, the Monte Carlo method is used to examine the effects on the sputtering characteristic parameters of sputtering yields, damage density distributions, and longitudinal energy damage distributions with different sputtering parameters and material models. Based on the particle tracking and physical statistical results of SRIM-2013 software, the effects of the initial energy of the ion beam, incident angle, ion type, and material type on surface sputtering and energy deposition are analyzed, and the relationship among surface damage distribution, sputtering parameters, and sputtering yield are studied. The results show that a beam-source inclination of 85° can promote the density concentration and peak density group of cascading particles to a surface of 2.8×10⁸ atom/cm² and 3$\times$10^-10 m, respectively, thereby reducing the average energy loss by 45.6% and increasing the Ar⁺ sputtering yield by a factor of 4.7. The substantial energy loss caused by phonons and ionization inhibits the increase in sputtering yield, and the two energy losses account for 69% and 30% of the total loss, respectively, at an incidence angle of 0°.