Multimode-interference-based crossing for metal-insulator-metal waveguides

Weijie Mai; Luna Cui; Li Yu

doi:10.3788/COL201715.032301

Journals >Chinese Optics Letters >Volume 15 >Issue 3 >Page 032301 > Article

Chinese Optics Letters
Vol. 15, Issue 3, 032301 (2017)

Multimode-interference-based crossing for metal-insulator-metal waveguides

Weijie Mai^1,2, Luna Cui^1,2,*, and Li Yu^1,2

Author Affiliations

¹State Key Laboratory of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications, Beijing 100876, China

²School of Science, Beijing University of Posts and Telecommunications, Beijing 100876, China

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DOI: 10.3788/COL201715.032301 Cite this Article Set citation alerts

Weijie Mai, Luna Cui, Li Yu, "Multimode-interference-based crossing for metal-insulator-metal waveguides," Chin. Opt. Lett. 15, 032301 (2017) Copy Citation Text

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Fig. 1. (a) Dispersion relation of MIM waveguide. (b) The field profile (Hy) of the first four TM modes in a 700 nm wide waveguide.

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Fig. 2. Schematic of the MMI-based crossing.

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Fig. 3. Calculated throughput and crosstalk for MMI-based crossing as function of the MMI length Lm. Here, ws=100 nm and Wm=560 nm.

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Fig. 4. Field distribution (Hy) at λ=1550 nm for (a) MIM-based crossing and (b) direct crossing. (c) Throughput (solid lines) and crosstalk (dashed lines) for MIM-based crossing (blue lines) and direct crossing (red lines).

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Fig. 5. Fabrication tolerance of the proposed MMI-based crossing when there is an MMI waveguide width variation ΔWm.

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