Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Shanshan Mao; Yanqiu Li; Jiahua Jiang; Shihuan Shen; Ke Liu; Meng Zheng

doi:10.3788/COL201816.030801

Journals >Chinese Optics Letters >Volume 16 >Issue 3 >Page 030801 > Article

Chinese Optics Letters
Vol. 16, Issue 3, 030801 (2018)

Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Shanshan Mao, Yanqiu Li^*, Jiahua Jiang, Shihuan Shen..., Ke Liu and Meng Zheng|Show fewer author(s)

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Key Laboratory of Photoelectron Imaging Technology and System of the Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

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DOI: 10.3788/COL201816.030801 Cite this Article Set citation alerts

Shanshan Mao, Yanqiu Li, Jiahua Jiang, Shihuan Shen, Ke Liu, Meng Zheng, "Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces," Chin. Opt. Lett. 16, 030801 (2018) Copy Citation Text

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