• Acta Photonica Sinica
  • Vol. 54, Issue 1, 0111002 (2025)
Hongyu HUANG*, Ruisheng WANG, Xiaomin LIN, Xianpeng LIANG..., Ming DONG and Quan YUAN|Show fewer author(s)
Author Affiliations
  • Shenyang Instrument Science Research Institute Co.,Ltd.,Shenyang 110043,China
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    DOI: 10.3788/gzxb20255401.0111002 Cite this Article
    Hongyu HUANG, Ruisheng WANG, Xiaomin LIN, Xianpeng LIANG, Ming DONG, Quan YUAN. Development of Low Wavefront Distortion Dichroic Mirror for Super-resolution Imaging[J]. Acta Photonica Sinica, 2025, 54(1): 0111002 Copy Citation Text show less
    The curve of PV variation with annealing temperature and its linear fitting graph
    Fig. 1. The curve of PV variation with annealing temperature and its linear fitting graph
    The variation curve of the film thickness ratio of Ta2O5 and SiO2 materials with annealing temperature under stress cancellation
    Fig. 2. The variation curve of the film thickness ratio of Ta2O5 and SiO2 materials with annealing temperature under stress cancellation
    Design spectral curve
    Fig. 3. Design spectral curve
    Spectral curve
    Fig. 4. Spectral curve
    Reflected PV value
    Fig. 5. Reflected PV value
    Spectral curve after environmental testing
    Fig. 6. Spectral curve after environmental testing
    Reflected PV value after environmental testing
    Fig. 7. Reflected PV value after environmental testing
    Angle of incidenceDimensionsTransmission bandReflection bandReflected PV
    45°40 mm×30 mm×2 mm504~544 nm588~800 nm450~491 nm556~566 nm<0.25λ
    Tavg>95%Tavg>95%Tabs<5%Tabs<5%@632.8 nm
    Table 1. The specifications of dichroic beamsplitter
    ParametersMaterialsMF power/WArgon flowOxygen flow
    PVD1Ta2O55 00025.0 Sccm35~50 Sccm
    PVD1Nb2O55 00025.0 Sccm35~50 Sccm
    PVD2SiO25 00025.0 Sccm10~15 Sccm
    Table 2. Optimal process parameters of Ta2O5,Nb2O5,SiO2
    Coating MaterialsJGS1(Reflected PV)@632.8 nmK9(Reflected PV)@632.8 nm
    Before coatingAfter coatingBefore coatingAfter coating
    2 000 nm Ta2O5-0.121λ-0.05λ-0.132λ0.179λ
    2 000 nm Nb2O5-0.115λ0.363λ-0.111λ0.681λ
    2 000 nm SiO2-0.134λ1.634λ-0.152λ1.651λ
    Table 3. Reflected PV values before and after coating 2 000 nm single-layer Ta2O5,Nb2O5,SiO2 materials
    Annealing temperatureJGS1(Reflected PV)@632.8 nmJGS1(Reflected ΔPV)@632.8 nm
    Ta2O5Nb2O5SiO2Ta2O5Nb2O5SiO2
    Unannealed-0.050λ0.363λ1.634λ0.071λ0.518λ1.768λ
    200 ℃-0.292λ0.345λ1.637λ-0.171λ0.5λ1.771λ
    250 ℃-0.493λ0.312λ1.628λ-0.372λ0.467λ1.762λ
    300 ℃-0.641λ0.299λ1.611λ-0.520λ0.454λ1.745λ
    350 ℃-0.753λ0.287λ1.555λ-0.632λ0.442λ1.689λ
    400 ℃-0.943λ0.277λ1.542λ-0.822λ0.432λ1.676λ
    Table 4. Reflected PV and ΔPV values of Ta2O5,Nb2O5,and SiO2 after annealing at different temperatures
    Hongyu HUANG, Ruisheng WANG, Xiaomin LIN, Xianpeng LIANG, Ming DONG, Quan YUAN. Development of Low Wavefront Distortion Dichroic Mirror for Super-resolution Imaging[J]. Acta Photonica Sinica, 2025, 54(1): 0111002
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