In this report, we demonstrate a novel technique for the microscopic patterning of gold by combining the photoreduction of AuIIIBr4 - to AuIBr2 - and the electrochemical reduction of AuIBr2 - to elemental gold in a single step within solution. While mask-based methods have been the norm for electroplating, the adoption of direct laser writing for flexible, real-time patterning has not been widespread. Through irradiation using a 405 nm laser and applying a voltage corresponding to a selective potential window specific to AuIBr2 -, we have shown that we can locally deposit elemental gold at the focal point of the laser. In addition to demonstrating the feasibility of the technique, we have collected data on the kinetics of the photoreduction reaction in ethanol and have deduced its rate law. We have confirmed the selective deposition of AuIBr2 - within a potential window through controlled potential electrolysis experiments and through direct measurement on a quartz crystal microbalance. Finally, we have verified local deposition through scanning electron microscopy.