A novel X-Y micro-motion mechanism was proposed based on a flexure hinge to meet the demand of the lithographic lens for X-Y adjusting mechanism with a small range and a high precision, then it was applied to the lithographic lens model to testify its performance. Firstly, the working principle of the mechanism was introduced based on the concept of mechanism degree of freedom(DOF) and instant center. Then, the structure of the mechanism was designed by using the flexure hinge instead of tradition hinge and the motion rigidity of mechanism, the ratio of input and output for displacement and its natural frequency and modes were all analyzed. The analysis results show that the rigidity values of mechanism X and Y are 1.99 μm/N and 1.96 μm/N respectively, the ratio of input and output for displacement in X and Y axes are -2.5 and -2.56, respectively, and the principle errors in X and Y axes are 8.22％ and 6.68％, respectively of its useful displacement. Finally, the mechanism was used in the lithographic lens systems to prove its performance, and the wavefront aberrations of the lens system were tested. The experiment results indicate that the wavefront aberrations of the systems before and after the mechanism adjusting compensations are 50.864 nm and 25.933 nm respectively. The X-Y flexural mechanism has good performance of aberration compensation, and it can satisfy the requirements of lithographic lens for high precision X-Y micro adjusting.