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    Journals >Infrared and Laser Engineering >Volume 36 >Issue 2 >Page 175 > Article
    • Infrared and Laser Engineering
    • Vol. 36, Issue 2, 175 (2007)
    Research status of the technical parameters of the pulsed laser deposited ferroelectric thin films
    1,2,*, 2, and 3
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese]. Research status of the technical parameters of the pulsed laser deposited ferroelectric thin films[J]. Infrared and Laser Engineering, 2007, 36(2): 175 Copy Citation Text show less

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    [in Chinese], [in Chinese], [in Chinese]. Research status of the technical parameters of the pulsed laser deposited ferroelectric thin films[J]. Infrared and Laser Engineering, 2007, 36(2): 175
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