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    Journals >Opto-Electronic Engineering >Volume 32 >Issue 11 >Page 20 > Article
    • Opto-Electronic Engineering
    • Vol. 32, Issue 11, 20 (2005)
    Study on the preparation and properties of antireflective ITO thin films by magnetron sputtering
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on the preparation and properties of antireflective ITO thin films by magnetron sputtering[J]. Opto-Electronic Engineering, 2005, 32(11): 20 Copy Citation Text show less

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study on the preparation and properties of antireflective ITO thin films by magnetron sputtering[J]. Opto-Electronic Engineering, 2005, 32(11): 20
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