• Chinese Journal of Lasers
  • Vol. 52, Issue 6, 0603103 (2025)
Bin Shen1,2,*, Haiyuan Li1, Xinglong Xie1,2, Xu Zhang1, and Huai Xiong1
Author Affiliations
  • 1Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • show less
    DOI: 10.3788/CJL241113 Cite this Article Set citation alerts
    Bin Shen, Haiyuan Li, Xinglong Xie, Xu Zhang, Huai Xiong. Surface Cladding of Third‑Harmonic Porous SiO2 Antireflective Film[J]. Chinese Journal of Lasers, 2025, 52(6): 0603103 Copy Citation Text show less
    Preparation process of third harmonic SiO2 antireflective films
    Fig. 1. Preparation process of third harmonic SiO2 antireflective films
    Optical properties of the films. (a) Transmittance; (b) refractive index
    Fig. 2. Optical properties of the films. (a) Transmittance; (b) refractive index
    SEM morphologies of different films. (a) 3AR+5MR; (b) 3AR
    Fig. 3. SEM morphologies of different films. (a) 3AR+5MR; (b) 3AR
    Transmission uniformity of different films. (a) 3AR+5MR; (b) 3AR
    Fig. 4. Transmission uniformity of different films. (a) 3AR+5MR; (b) 3AR
    Changes in contact angle between the films and water. (a) 3AR+5MR; (b) 3AR
    Fig. 5. Changes in contact angle between the films and water. (a) 3AR+5MR; (b) 3AR
    Changes in optical properties of the films after 85%+15% experiment. (a) 3AR+5MR; (b) 3AR
    Fig. 6. Changes in optical properties of the films after 85%+15% experiment. (a) 3AR+5MR; (b) 3AR
    Changes in optical properties of the films after 85 ℃+85%RH experiment. (a) 3AR+5MR; (b) 3AR
    Fig. 7. Changes in optical properties of the films after 85 ℃+85%RH experiment. (a) 3AR+5MR; (b) 3AR
    AFM morphology of the films. (a)(d) Original films; (b)(e) after 85%+15% experiment; (c)(f) after 85 ℃+85%RH experiment
    Fig. 8. AFM morphology of the films. (a)(d) Original films; (b)(e) after 85%+15% experiment; (c)(f) after 85 ℃+85%RH experiment
    Surface roughness of the films
    Fig. 9. Surface roughness of the films
    Laser induced damage threshold of the films. (a) Original films; (b) after 85%+15% experiment; (c) after 85 ℃+85%RH experiment
    Fig. 10. Laser induced damage threshold of the films. (a) Original films; (b) after 85%+15% experiment; (c) after 85 ℃+85%RH experiment
    Bin Shen, Haiyuan Li, Xinglong Xie, Xu Zhang, Huai Xiong. Surface Cladding of Third‑Harmonic Porous SiO2 Antireflective Film[J]. Chinese Journal of Lasers, 2025, 52(6): 0603103
    Download Citation