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    Journals >Opto-Electronic Engineering >Volume 32 >Issue 10 >Page 1 > Article
    • Opto-Electronic Engineering
    • Vol. 32, Issue 10, 1 (2005)
    Study of DLC films residual stress by unbalanced magnetron sputtering technology
    1,2, 2, 1, and 1
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  • 1[in Chinese]
  • 2[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of DLC films residual stress by unbalanced magnetron sputtering technology[J]. Opto-Electronic Engineering, 2005, 32(10): 1 Copy Citation Text show less

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of DLC films residual stress by unbalanced magnetron sputtering technology[J]. Opto-Electronic Engineering, 2005, 32(10): 1
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