• Semiconductor Optoelectronics
  • Vol. 41, Issue 3, 395 (2020)
LI Qi1,2, QI Yuejing1,2,*, LU Zengxiong1,2, ZHANG Qingyang1..., MA Jing1, YANG Guanghua1,2 and SU Jiani1|Show fewer author(s)
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.16818/j.issn1001-5868.2020.03.018 Cite this Article
    LI Qi, QI Yuejing, LU Zengxiong, ZHANG Qingyang, MA Jing, YANG Guanghua, SU Jiani. Design of Homogenizing Optical System for Testing CMOS Image Sensor in Deep Ultraviolet Region[J]. Semiconductor Optoelectronics, 2020, 41(3): 395 Copy Citation Text show less

    Abstract

    The uniformity of the uniform light system is the key for the parameter test of deep ultraviolet CMOS image sensors. Based on the Fourier optics theory and combining the characteristics of the ArF excimer laser output spot, the initial structure of the compound-eye array uniform light system was designed, and a uniform light system model was established in ZEMAX non-sequential mode. According to the characteristics of the randomness of the light sampling in the ZEMAX light source and the uniformity requirements of the uniform light system, the number of tracking rays and the number of lens elements in the compound eye array were optimized. By setting the lens element size of 1mm, applying 100million rays and being averaged for 30 times, a uniform illumination spot with a uniformity of 0.986 is obtained in the 12mm×12mm spot range, which is better than the requirement on the spot uniformity of 0.97 for CMOS image sensors.
    LI Qi, QI Yuejing, LU Zengxiong, ZHANG Qingyang, MA Jing, YANG Guanghua, SU Jiani. Design of Homogenizing Optical System for Testing CMOS Image Sensor in Deep Ultraviolet Region[J]. Semiconductor Optoelectronics, 2020, 41(3): 395
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