A method for preparing high performance vanadium oxide thermosensitive thin films and its application were reported. Using reactive magnetron sputtering film deposition technology, the preparation process of vanadium oxide thin films was optimized by changing the sputtering power during the deposition of vanadium oxide thermosensitive thin films, the deposition rate of vanadium atoms was adjusted when they touched the surface of the substrate after being sputtered. At the same time, the equipment was modified and upgraded, that is, a control power supply outside the vanadium sputtering chamber was added to accurately control the sputtering voltage and oxygen partial pressure and other parameters to accurately control the current density in the reaction process. A vanadium oxide film with a sheet resistance of 500 kΩ/□ and a temperature coefficient of resistance (TCR) of -2.7% K^-1 was prepared. The experimental results show that the noise equivalent temperature difference (NETD) performance of uncooled infrared focal plane detector made of high-performance vanadium oxide thermal sensitive film is reduced by 30% and the noise is reduced by 28%. The overall performance of the uncooled focal plane detector has been improved significantly.