Development and Application of Chemical Mechanical Polishing Surface-Pressure Distribution Detection Device Based on Thin-Film Sensors

Chupeng Zhang; Linxiao Yang; Han Xu; Jiazheng Sun; Yingxue Li; Xiao Chen

doi:10.3788/LOP223379

Journals >Laser & Optoelectronics Progress >Volume 60 >Issue 15 >Page 1512002 > Article

Laser & Optoelectronics Progress
Vol. 60, Issue 15, 1512002 (2023)

Development and Application of Chemical Mechanical Polishing Surface-Pressure Distribution Detection Device Based on Thin-Film Sensors

Chupeng Zhang^1,*, Linxiao Yang¹, Han Xu¹, Jiazheng Sun¹..., Yingxue Li² and Xiao Chen¹|Show fewer author(s)

Author Affiliations

¹College of Mechanical Engineering, Hubei University of Technology, Wuhan 430068, Hubei, China

²College of Locomotive and Rolling Stock Engineering, Dalian Jiaotong University, Dalian 116028, Liaoning, China

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DOI: 10.3788/LOP223379 Cite this Article Set citation alerts

Chupeng Zhang, Linxiao Yang, Han Xu, Jiazheng Sun, Yingxue Li, Xiao Chen. Development and Application of Chemical Mechanical Polishing Surface-Pressure Distribution Detection Device Based on Thin-Film Sensors[J]. Laser & Optoelectronics Progress, 2023, 60(15): 1512002 Copy Citation Text

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