• Journal of Applied Optics
  • Vol. 43, Issue 4, 565 (2022)
Bing YU
Author Affiliations
  • [in Chinese]
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    DOI: 10.5768/JAO202243.0409002 Cite this Article
    Bing YU. Progress and prospects in national defense optical metrology technology[J]. Journal of Applied Optics, 2022, 43(4): 565 Copy Citation Text show less

    Abstract

    With the development of optical theory and the progress of science and technology, the optical technology has developed rapidly, which puts forward new requirements and challenges to the optical metrology technology. Aiming at the importance of optical metrology in national defense and military, the new requirements of the development of national equipment support for national defense optical metrology were analyzed, and introduced the development status of the first scale optical metrology station of the science, technology and industry for national defense in metrology of basic physical quantities of optical imaging and optical radiation, comprehensive parameters metrology guarantee of weapons and photoelectric equipment, optical frontier technology metrology and development of military photoelectric testing equipment. The main problems of national defense optical metrology and its future development trend were also proposed.