• Laser & Optoelectronics Progress
  • Vol. 59, Issue 14, 1415004 (2022)
Yonghong Wang1,2,*, Yanfeng Yao1, Junrui Li1,2, Peizheng Yan1,2..., Chen Li1 and Shuangle Wu1|Show fewer author(s)
Author Affiliations
  • 1School of Instrument Science and Opto-Electronics Engineering, Hefei University of Technology, Hefei 230009, Anhui , China
  • 2Anhui Province Key Laboratory of Measuring Theory and Precision Instrument, Hefei University of Technology, Hefei 230009, Anhui , China
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    DOI: 10.3788/LOP202259.1415004 Cite this Article Set citation alerts
    Yonghong Wang, Yanfeng Yao, Junrui Li, Peizheng Yan, Chen Li, Shuangle Wu. Progresses of Shearography: Key Technologies and Applications[J]. Laser & Optoelectronics Progress, 2022, 59(14): 1415004 Copy Citation Text show less
    Dynamic shearography measurement system based on slit diaphragm[26]
    Fig. 1. Dynamic shearography measurement system based on slit diaphragm[26]
    Spatial phase-shift shearography system based on adjustable apertures[28]
    Fig. 2. Spatial phase-shift shearography system based on adjustable apertures[28]
    Spatial phase-shift measurement based on micro-polarization arrays[30]. (a) Schematic of the measurement system; (b) phase maps after spatiotemporal low-pass filtering
    Fig. 3. Spatial phase-shift measurement based on micro-polarization arrays[30]. (a) Schematic of the measurement system; (b) phase maps after spatiotemporal low-pass filtering
    Double imaging Mach-Zehnder space carrier shearing system[36]
    Fig. 4. Double imaging Mach-Zehnder space carrier shearing system[36]
    Multi-directional shearing Mach-Zehnder interference system[37]
    Fig. 5. Multi-directional shearing Mach-Zehnder interference system[37]
    Schematic of 3D measurement[41]
    Fig. 6. Schematic of 3D measurement[41]
    Measurement results[41]. (a) In-plane horizontal deformation u; (b) in-plane horizontal deformation gradient ∂u/∂x; (c) in-plane vertical deformation v; (d) in-plane vertical deformation gradient ∂v/∂x; (e) out-of-plane deformation w; (f) out-of-plane deformation gradient ∂w/∂x
    Fig. 7. Measurement results[41]. (a) In-plane horizontal deformation u; (b) in-plane horizontal deformation gradient u/x; (c) in-plane vertical deformation v; (d) in-plane vertical deformation gradient v/x; (e) out-of-plane deformation w; (f) out-of-plane deformation gradient w/x
    Schematic of multiplexing measurement based on polarization technology[42]
    Fig. 8. Schematic of multiplexing measurement based on polarization technology[42]
    Shearography system based on spatial light modulator[44]
    Fig. 9. Shearography system based on spatial light modulator[44]
    Shearography system based on liquid crystal polarization grating[49]
    Fig. 10. Shearography system based on liquid crystal polarization grating[49]
    Measurement results for mirror[65]. (a) Measurement result for out-of-plane deformation; (b) detection result for internal defect
    Fig. 11. Measurement results for mirror[65]. (a) Measurement result for out-of-plane deformation; (b) detection result for internal defect
    Yonghong Wang, Yanfeng Yao, Junrui Li, Peizheng Yan, Chen Li, Shuangle Wu. Progresses of Shearography: Key Technologies and Applications[J]. Laser & Optoelectronics Progress, 2022, 59(14): 1415004
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