• Optics and Precision Engineering
  • Vol. 31, Issue 14, 2060 (2023)
Fuxin PENG1, Zhongwei HU1,*, Yu CHEN1, Binhui XIE2, and Zhihao ZHOU2
Author Affiliations
  • 1Institute of Manufacturing Engineering, Huaqiao University, Xiamen3602,China
  • 2Fujian Jing'An Opto.Electronics Co., Ltd, Quanzhou36411, China
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    DOI: 10.37188/OPE.20233114.2060 Cite this Article
    Fuxin PENG, Zhongwei HU, Yu CHEN, Binhui XIE, Zhihao ZHOU. Surface crack depth detection of sapphire substrate two-sided lapping[J]. Optics and Precision Engineering, 2023, 31(14): 2060 Copy Citation Text show less
    Double side grinding machine
    Fig. 1. Double side grinding machine
    Section microscopic observation method sample
    Fig. 2. Section microscopic observation method sample
    Principle of Focused Ion Beam Side Observation
    Fig. 3. Principle of Focused Ion Beam Side Observation
    High temperature etching machine
    Fig. 4. High temperature etching machine
    Grinding sapphire substrate etching rate curve
    Fig. 5. Grinding sapphire substrate etching rate curve
    Magnetorheological polishing sapphire substrate
    Fig. 6. Magnetorheological polishing sapphire substrate
    Magnetorheological polishing spot midline contour curve
    Fig. 7. Magnetorheological polishing spot midline contour curve
    CMP Polishing machine
    Fig. 8. CMP Polishing machine
    Polishing cross section cracks on double side grinding sapphire substrate
    Fig. 9. Polishing cross section cracks on double side grinding sapphire substrate
    Cross section crack of focused ion beam in double side polished sapphire wafer
    Fig. 10. Cross section crack of focused ion beam in double side polished sapphire wafer
    Differential etching rate curve of grinding sapphire
    Fig. 11. Differential etching rate curve of grinding sapphire
    Surface morphology changes of sapphire after grinding for 30-40 min
    Fig. 12. Surface morphology changes of sapphire after grinding for 30-40 min
    Surface morphology of different points on the midline of polishing spot
    Fig. 13. Surface morphology of different points on the midline of polishing spot
    Surface morphology of polished sapphire layer by layer
    Fig. 14. Surface morphology of polished sapphire layer by layer
    Models of surface and subsurface cracks on double-sided grinding sapphire substrate
    Fig. 15. Models of surface and subsurface cracks on double-sided grinding sapphire substrate
    量测方法裂纹深度
    差动蚀刻速率法9~10
    磁流变抛光法25~30
    逐层抛光法30~35
    Table 1. Crack depth measured by different methods
    Fuxin PENG, Zhongwei HU, Yu CHEN, Binhui XIE, Zhihao ZHOU. Surface crack depth detection of sapphire substrate two-sided lapping[J]. Optics and Precision Engineering, 2023, 31(14): 2060
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