• Semiconductor Optoelectronics
  • Vol. 43, Issue 3, 517 (2022)
YIN Haotian1, DING Guangyu1, HAN Jun2, XING Yanhui1, and DENG Xuguang3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.16818/j.issn1001-5868.2022012802 Cite this Article
    YIN Haotian, DING Guangyu, HAN Jun, XING Yanhui, DENG Xuguang. Effect of ScAlN Buffer Layer Thickness on GaN Epitaxial Layer on Si(100) Substrate[J]. Semiconductor Optoelectronics, 2022, 43(3): 517 Copy Citation Text show less
    References

    [1] Jin X M, Trieu S, Chavoor G J, et al. Enhancing GaN LED efficiency through nanogratings and standing wave analysis[J]. Nanomaterials, 2018, 8(12): 1045.

    [3] Peart M R, Borovac D, Sun W, et al. AlInN/GaN diodes for power electronic devices[J]. Appl. Phys. Express, 2020, 13(9): 091006.

    [4] Tripathy S, Lin V K X, Dolmanan S B, et al. AlGaN/GaN twodimensionalelectron gas heterostructures on 200mm diameter Si(111)[J]. Appl. Phys. Lett., 2012, 101(8): 082110.

    [5] Schulze F, Dadgar A, Blsing J, et al. GaN heteroepitaxy on Si(001)[J]. J. of Crystal Growth, 2004, 272: 496499.

    [6] Zhang S, Fu W Y, Holec D, et al. Elastic constants and critical thicknesses of ScGaN and ScAlN[J]. J. of Appl. Phys., 2013, 114(24): 243516.

    [10] Liu Y, Yang Z L, Long X J, et al. Effects of thickness and interlayer on optical properties of AlN films at room and high temperature[J]. J. of Vacuum Science & Technol. A, 2021, 39(4): 043402.

    [11] Lee S R, West A M, Allerman A A, et al. Effect of threading dislocations on the Bragg peakwidths of GaN, AlGaN, and AlN heterolayers[J]. Appl. Phys. Lett., 2005, 86(24): 241904.

    [12] Kisielowski C, Krüger J, Ruvimov S, et al. Strainrelated phenomena in GaN thin films[J]. Phys. Rev. B, 1996, 54(24): 1774517753.

    YIN Haotian, DING Guangyu, HAN Jun, XING Yanhui, DENG Xuguang. Effect of ScAlN Buffer Layer Thickness on GaN Epitaxial Layer on Si(100) Substrate[J]. Semiconductor Optoelectronics, 2022, 43(3): 517
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