• Optics and Precision Engineering
  • Vol. 16, Issue 6, 1031 (2008)
XU Shi-jun1,2,* and REN Xiao-ling3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: Cite this Article
    XU Shi-jun, REN Xiao-ling. Optical thin-film depositing monitoring systems with four-light beams[J]. Optics and Precision Engineering, 2008, 16(6): 1031 Copy Citation Text show less

    Abstract

    By considering the poor monitoring conditions of universal coating equipments with low stability,precision and automation level,a new kind of photoelectricity-control-analysis system was developed.Based on double-frequency modulation,a photoelectric test system with four-light beams was put forward.A dual-lock-phase circuit system and a comprehensive digital processing system with compound filter were used to process monitoring signals,and all automation-monitoring functions were achieved with a control-analysis system.The experimental results show that standard deviation of Thin Film Thickness(TFT) is equal to or less than 0.55%,and signal-noise ratio approaches to 1 000.A very good linearity of numeral display is obtained and the display resolution limit on reflectivity is 0.02%.The linearity of static drift is very high,the drift ratio is less than 1.95%/h,and the static stabilities are double superior to that of universal system.It is concluded that proposed system has advantages of the static and dynamic stabilities,the signal-noise ratio,and the control precision for TFT.
    XU Shi-jun, REN Xiao-ling. Optical thin-film depositing monitoring systems with four-light beams[J]. Optics and Precision Engineering, 2008, 16(6): 1031
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