Critical Pattern Selection Method for Full-Chip Source and Mask Optimization Based on Depth-First Search

Xinhua Yang; Sikun Li; Lufeng Liao; Libin Zhang; Shuang Zhang; Shengrui Zhang; Weijie Shi; Yayi Wei; Xiangzhao Wang

doi:10.3788/AOS202242.1022002

Journals >Acta Optica Sinica >Volume 42 >Issue 10 >Page 1022002 > Article

Acta Optica Sinica
Vol. 42, Issue 10, 1022002 (2022)

Critical Pattern Selection Method for Full-Chip Source and Mask Optimization Based on Depth-First Search

Xinhua Yang^1,2, Sikun Li^1,2,*, Lufeng Liao^1,2, Libin Zhang³..., Shuang Zhang³, Shengrui Zhang⁴, Weijie Shi⁴, Yayi Wei³ and Xiangzhao Wang^1,2|Show fewer author(s)

Author Affiliations

¹Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China;

⁴DongFang JingYuan Electron Limited, Beijing 100176, China

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DOI: 10.3788/AOS202242.1022002 Cite this Article Set citation alerts

Xinhua Yang, Sikun Li, Lufeng Liao, Libin Zhang, Shuang Zhang, Shengrui Zhang, Weijie Shi, Yayi Wei, Xiangzhao Wang. Critical Pattern Selection Method for Full-Chip Source and Mask Optimization Based on Depth-First Search[J]. Acta Optica Sinica, 2022, 42(10): 1022002 Copy Citation Text

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