• Laser & Optoelectronics Progress
  • Vol. 62, Issue 3, 0314001 (2025)
Liang He1,2, Zhenlin Hu1,2, Tianze Wang1,2, Nan Lin1,2,*, and Yuxin Leng1,2
Author Affiliations
  • 1Key Laboratory of Ultra-Intense Laser Science and Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Department of Precision Optics Engineering, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
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    DOI: 10.3788/LOP242211 Cite this Article Set citation alerts
    Liang He, Zhenlin Hu, Tianze Wang, Nan Lin, Yuxin Leng. Experimental Study on Highly Effective Broadband Extreme Ultraviolet Light Source by Spatially Confined Plasma[J]. Laser & Optoelectronics Progress, 2025, 62(3): 0314001 Copy Citation Text show less
    Layout of broadband LPP-EUV light source experiment
    Fig. 1. Layout of broadband LPP-EUV light source experiment
    EUV spectrometer
    Fig. 2. EUV spectrometer
    Transmission efficiency characterization. (a) Reflectivity of Au mirror; (b) diffraction efficiency of EUV grating; (c) CCD quantum efficiency; (d) transmission efficiency of EUV spectrometer
    Fig. 3. Transmission efficiency characterization. (a) Reflectivity of Au mirror; (b) diffraction efficiency of EUV grating; (c) CCD quantum efficiency; (d) transmission efficiency of EUV spectrometer
    EUV spectra at different laser intensities for the first and second pulse
    Fig. 4. EUV spectra at different laser intensities for the first and second pulse
    Conversion efficiency of the first and second pulse at different laser intensities. (a) 13.5 nm (2% bandwidth) conversion efficiency; (b) total conversion efficiency of 10‒20 nm
    Fig. 5. Conversion efficiency of the first and second pulse at different laser intensities. (a) 13.5 nm (2% bandwidth) conversion efficiency; (b) total conversion efficiency of 10‒20 nm
    Comparison of the first and second laser pulses ablating the target surface
    Fig. 6. Comparison of the first and second laser pulses ablating the target surface
    Pulse numberFull width at half maximum /nm
    0.33×1010 W/cm20.58×1010 W/cm22.1×1010 W/cm23.45×1010 W/cm25.38×1010 W/cm2
    First5.972.572.832.332.15
    Second6.515.243.913.413.03
    Table 1. Full width at half maximum of EUV spectra at different laser intensities for the first and second pulse
    Liang He, Zhenlin Hu, Tianze Wang, Nan Lin, Yuxin Leng. Experimental Study on Highly Effective Broadband Extreme Ultraviolet Light Source by Spatially Confined Plasma[J]. Laser & Optoelectronics Progress, 2025, 62(3): 0314001
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