Advanced micro–nano devices commonly require precise three-dimensional (3D) fabrication solutions for pre-designing and integrating 0D to 3D configurations. The additive–subtractive hybrid manufacturing strategy dominated by femtosecond laser direct writing has become an increasingly interesting technical route for material processing. In this study, a novel approach termed femtosecond adaptive optics-assisted hybrid manufacturing was proposed, which integrates subtractive (femtosecond laser ablation) and additive (two-photon polymerization) fabrication. In this hybrid manufacturing method, the introduction of adaptive optics offers parallel direct writing and wide-area material processing capabilities. To demonstrate the validity of the hybrid approach, on-chip surface plasmon polariton waveguides with strong sub-wavelength field confinement and enhanced functionality were successfully fabricated. In comparison with the terahertz-wave devices fabricated based on the focused ion beam technique, the functional tests in terahertz near-field microscopy show a rival performance fabricated with our hybrid approach. Besides, our cost-effective solution also dramatically reduces the fabricating time of excitation regions by a factor $>16$. Our work provides a new inspiration in integrated photonics.