Shuhui Li, Hongxiao Song, Yazhou Cheng. Fabrication and characterization of ridge waveguide in MgF2 crystal at mid-infrared 4 μm wavelength (invited)[J]. Infrared and Laser Engineering, 2022, 51(7): 20220441
- Infrared and Laser Engineering
- Vol. 51, Issue 7, 20220441 (2022)
Fig. 1. Schematic diagram of preparation process of MgF2 ridge optical waveguide
Fig. 2. Schematic diagram of end-face coupling system for optical waveguide
Fig. 3. (a) Relation of electronic energy damage (red line) and nuclear energy damage (blue line) with the irradiation depth of C5+ ions; (b) Reconstructed relation of refraction index of MgF2 ridge waveguide with the waveguide depth at 4 μm wavelength
Fig. 4. Sectional microscopic image of optical ridge waveguide; (b) Experimental diagram of near-field mode distribution at 4 μm wavelength; (c) Simulated diagram of near-field mode distribution at 4 μm wavelength of optical ridge waveguide
Fig. 5. Relation diagram of propagation loss of MgF2 optical ridge waveguide after thermal annealing treatment
Fig. 6. Raman spectra of waveguide layer and substrate layer of MgF2 crystal material
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