Researching | Fabrication of sub-diffraction limit high-aspect-ratio nanostructures via laser direct writing

Journals >Chinese Optics Letters >Volume 23 >Issue 3 >Page 033602 > Article

Chinese Optics Letters
Vol. 23, Issue 3, 033602 (2025)

Fabrication of sub-diffraction limit high-aspect-ratio nanostructures via laser direct writing | On the Cover

Guoliang Chen¹, Houan Teng¹, Jian Chen¹, and Qiwen Zhan^1,2,3,*

Author Affiliations

¹School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China

²Zhangjiang Laboratory, Shanghai 201204, China

³International Institute for Sustainability with Knotted Chiral Meta Matter (WPI-SKCM2), Hiroshima University, Hiroshima 739-8526, Japan

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DOI: 10.3788/COL202523.033602 Cite this Article Set citation alerts

Guoliang Chen, Houan Teng, Jian Chen, Qiwen Zhan, "Fabrication of sub-diffraction limit high-aspect-ratio nanostructures via laser direct writing," Chin. Opt. Lett. 23, 033602 (2025) Copy Citation Text

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References

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Guoliang Chen, Houan Teng, Jian Chen, Qiwen Zhan, "Fabrication of sub-diffraction limit high-aspect-ratio nanostructures via laser direct writing," Chin. Opt. Lett. 23, 033602 (2025)

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